TIENYU TERRY SHENG
Pilots at Sea Gull Way, Saratoga, CA
License number
California A3836973
Issued Date
Jun 2016
Expiration Date
Jun 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
19911 Sea Gull Way, Saratoga, CA 95070
Professional information
Method And Device Of Ion Source Generation
US Patent:
7687784, Mar 30, 2010
Filed:
May 23, 2008
Appl. No.:
12/126312
Inventors:
Nai-Yuan Cheng - Taipei, TW
Yun-Ju Yang - Taichung, TW
Cheng-Hui Shen - Hsinchu County, TW
Junhua Hong - San Jose CA, US
Jiong Chen - San Jose CA, US
Tienyu Sheng - Saratoga CA, US
Linuan Chen - San Jose CA, US
Yun-Ju Yang - Taichung, TW
Cheng-Hui Shen - Hsinchu County, TW
Junhua Hong - San Jose CA, US
Jiong Chen - San Jose CA, US
Tienyu Sheng - Saratoga CA, US
Linuan Chen - San Jose CA, US
Assignee:
Advanced Ion Beam Technology, Inc. - Hsinchu
Advanced Ion Beam Technology, Inc. - San Jose CA
Advanced Ion Beam Technology, Inc. - San Jose CA
International Classification:
H01J 7/24, H01J 27/02, H01J 49/10
US Classification:
250423R, 250424, 250427, 25049221, 31511181, 31511191
Abstract:
An implanter is equipped with an ion beam current detector, a temperature sensor, a temperature controller and a cooling system to increase the ratio of a specific ion cluster in the ion source chamber of the implanter. Therefore, the implanting efficiency for a shallow ion implantation is increased consequently.
Process Chemistry Resistant Manometer
US Patent:
6132513, Oct 17, 2000
Filed:
Mar 31, 1999
Appl. No.:
9/283134
Inventors:
Babak Kadkhodayan - Oakland CA
Andreas Fischer - Fremont CA
Tienyu T. Sheng - Saratoga CA
Gregory A. Tomasch - San Jose CA
Andreas Fischer - Fremont CA
Tienyu T. Sheng - Saratoga CA
Gregory A. Tomasch - San Jose CA
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
C23C 1600, H05H 100, G01L 1900
US Classification:
118715
Abstract:
A manometer resistant to chemical change caused by process chemistry used in a plasma processing chamber is provided. The manometer includes a pressure sensitive diaphragm attached to a housing wherein at least a portion of the pressure sensitive diaphragm is rendered resistant to chemical change caused by process chemistry.