Inventors:
Juliana Arifin - , US
Thinh Tran - San Jose CA, US
International Classification:
G03F007/20
US Classification:
430/394000, 430/312000, 430/313000, 430/318000
Abstract:
The invention provides a structuring method, in particular for stepped wafer or die surfaces. The method includes photolithographically exposing a pattern comprising at least a first pattern portion and a second pattern portion onto a surface, said surface comprising at least a first surface portion at which a tangential plane to the surface extends in a first plane and a second surface portion at which a tangential plane to the surface extends in a second plane not coinciding with the first plane. The method comprises a first exposure step, in which the first pattern portion is exposed. Therein, the first pattern portion is focused into a first focal plane. The method further comprises a second exposure step, in which the second pattern portion is exposed. Therein, the second pattern portion is focused into a second focal plane which is different from the first focal plane.