Inventors:
Avgerinos V. Gelatos - Redwood City CA, US
Xiaoxiong Yuan - San Jose CA, US
Salvador P. Umotoy - Antioch CA, US
Yu Chang - San Jose CA, US
Emily Renuart - Santa Clara CA, US
Jing Lin - Mountain View CA, US
Wing-Cheong Lai - Santa Clara CA, US
Sang Q. Le - San Jose CA, US
International Classification:
C23C 16/06
Abstract:
Embodiments of the invention provide apparatuses for vapor depositing tungsten-containing materials, such as metallic tungsten and tungsten nitride. In one embodiment, a processing chamber is provided which includes a lid assembly containing a lid plate, a showerhead, a mixing cavity, a distribution cavity, and a resistive heating element contained within the lid plate. In one example, the resistive heating element is configured to provide the lid plate at a temperature within a range from about 120° C. to about 180° C., preferably, from about 140° C. to about 160° C., more preferably, from about 145° C. to about 155° C. The mixing cavity may be in fluid communication with a tungsten precursor source containing tungsten hexafluoride and a nitrogen precursor source containing ammonia. In some embodiments, a single processing chamber may be used to deposit metallic tungsten and tungsten nitride materials by CVD processes.