Richard H Crockett
Engineers at Creekside Dr, San Jose, CA

License number
Colorado 10403
Issued Date
Apr 24, 1971
Renew Date
Mar 24, 1986
Expiration Date
Mar 24, 1986
Type
Professional Engineer
Address
Address
2783 Creekside Dr, San Jose, CA 95132
LicenseFiles verified this license of Dec 9, 2016 at the Colorado - Department of Regulatory Agencies.

Professional information

Richard Crockett Photo 1

Apparatus For Heating And Cooling Semiconductor Wafers In Semiconductor Wafer Processing Equipment

US Patent:
5248370, Sep 28, 1993
Filed:
Nov 7, 1991
Appl. No.:
7/789394
Inventors:
Chiu-Wing Tsui - Santa Clara CA
Richard H. Crockett - San Jose CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
H01L 2100
US Classification:
156345
Abstract:
A method for heating or cooling a semiconductor wafer in semiconductor processing apparatus is described which comprises directing into contact with a surface of the wafer at least a portion of one or more components of the process gas to transfer heat between the wafer and a wafer support positioned in the apparatus adjacent to the wafer. Method and apparatus are also described for controlling the total flow of process gas through the apparatus and for monitoring the pressure in said apparatus to maintain the desired pressure therein.

Richard Crockett Photo 2

Method For Transferring Heat To Or From A Semiconductor Wafer Using A Portion Of A Process Gas

US Patent:
5443997, Aug 22, 1995
Filed:
May 13, 1992
Appl. No.:
7/884456
Inventors:
Chiu-Wing Tsui - Santa Clara CA
Richard H. Crockett - San Jose CA
International Classification:
H01L 2100, H01L 2102, G03F 726
US Classification:
437225
Abstract:
A method for heating or cooling a semiconductor wafer in semiconductor processing apparatus is described which comprises directing into contact with a surface of the wafer at least a portion of one or more components of the process gas to transfer heat between the wafer and a wafer support positioned in the apparatus adjacent to the wafer. Method and apparatus are also described for controlling the total flow of process gas through the apparatus and for monitoring the pressure in said apparatus to maintain the desired pressure therein.

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