MR. PETER T. MITCHELL, M.S.N., R.N., C.N.P.
Nursing at Veterans Dr, Minneapolis, MN
License number
Minnesota RN 111477-5
Category
Nursing
Type
Family
Address
Address
1 Veterans Dr, Minneapolis, MN 55417
Phone
(612) 467-2986
Organization information
See more information about PETER T. MITCHELL at bizstanding.comPeter T Mitchell
1 Veterans Dr #111H, Minneapolis, MN 55417
Categories:
Nurse Practitioners
Phone:
(612) 467-2986 (Phone)
Professional information
Occupational Health Provider.
Position:
Nurse Practitioner at Minneapolis VA Health Care System
Location:
Greater Minneapolis-St. Paul Area
Industry:
Hospital & Health Care
Work:
Minneapolis VA Health Care System
- Minneapolis, Minnesota since Jun 2001
-
Nurse Practitioner
Minnesota Nurse Practitioners
2009 - 2011
-
Volunteer Leader
American Nurses Association
Jun 2006 - Jun 2010
-
Volunteer Leader
Abbott Northwestern Hospital
1987 - 1999
-
Registered Nurse
Education:
University of Minnesota-Twin Cities 1997 - 1999
MSN, Nursing, Family Nurse Practitioner University of Minnesota School of Nursing 1995 - 1999
Master's of Science, Nursing
MSN, Nursing, Family Nurse Practitioner University of Minnesota School of Nursing 1995 - 1999
Master's of Science, Nursing
Peter T Mitchell, Minneapolis MN - RN (Registered Nurse)
Specialties:
Nursing (Nurse Practitioner)
Address:
1 Veterans Dr, Minneapolis 55417
(612) 467-2986 (Phone)
(612) 467-2986 (Phone)
Languages:
English
Peter Mitchell
Location:
Greater Minneapolis-St. Paul Area
Industry:
Computer Software
Peter T Mitchell, Minneapolis MN
Specialties:
Nurse Practitioner
Address:
1 Veterans Dr, Minneapolis, MN 55417
Method Of Providing A Mark For Identification On A Silicon Surface
US Patent:
5610104, Mar 11, 1997
Filed:
May 21, 1996
Appl. No.:
8/664252
Inventors:
Peter Mitchell - Bloomington MN
Assignee:
Cypress Semiconductor Corporation - San Jose CA
International Classification:
H01L 21465
US Classification:
437228
Abstract:
The present invention concerns a method for making an identification mark on a silicon surface. In a preferred embodiment, the identification mark formed on the silicon surface does not substantially score the silicon. A silicon or silicon dioxide surface coated with an insulating layer is marked by laser scribing, leaving an exposed area on the silicon or the silicon dioxide. The exposed area on the silicon wafer is preferably not marked by the laser scribing. The exposed silicon surface is then oxidized by dry or wet oxidizing. The silicon oxide can be subsequently removed to leave an etched mark. The method reduces or eliminates the formation of stresses and silicon slag at the etched mark that can cause defects and reduce yield.