Inventors:
Donald W. Heidt - Whitewright TX
Steve Thompson - Kalispell MT
Worm Lund - Seattle WA
Raymon F. Thompson - Kalispell MT
Larry M. Beasley - Austin TX
International Classification:
F27D 312
Abstract:
Semiconductor wafers within a supporting vertical wafer tower are positioned within a vertical process chamber through a lower gate valve fixed to a supporting framework. The gate valve is sealed to a similar gate valve at the upper end of a movable load lock on the framework, within which the wafers are subjected to pre-treatment and post-treatment processes. Two load locks are alternately used in conjunction with the process chamber and a wafer loading station on the framework. In addition, a cleaning element is movably mounted on the framework for periodically maintaining the interior surfaces of the process tube within the process chamber.