Inventors:
Douglas R. Robello - Rochester NY
Joseph F. Revelli - Rochester NY
Jeffrey I. Hirsh - Rochester NY
Assignee:
Eastman Kodak Company - Rochester NY
International Classification:
G03F 740
Abstract:
In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate,
(a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure ##STR1## wherein: n is 2 or greater;
x is selected from the group consisting of H, CH. sub. 3, Br and Cl; and
Z is selected from the group consisting of nil, O, S, CH. sub. 2, C. dbd. O, SO, SO. sub. 2, CH--CH. sub. 3, CH. sub. 3 --C--CH. sub. 3, CF. sub. 3 --C--CF. sub. 3, CH. sub. 3 --C--CH. sub. 2 CH. sub. 3, ##STR2## (b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed;
(c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern;
(d) removing the thin etch-stop mask; and
(e) thermally reflowing the patterned transparent layer to form the transparent lenslets.