MR. EDWARD JAMES, RN
Nursing at Clement St, San Francisco, CA
License number
California 25696
Category
Nursing
Type
Registered Nurse
Address
Address
4150 Clement St, San Francisco, CA 94121
Phone
(415) 221-4810
Personal information
See more information about EDWARD JAMES at radaris.comName
Address
Phone
4806 Hartwick Rd, Rocklin, CA 95765
500 Whitecliff Dr, Vallejo, CA 94589
549 E Dunton Ave, Orange, CA 92865
6106 Village 6, Camarillo, CA 93012
605 Redondo Ave UNIT 203, Long Beach, CA 90814
Professional information
Independent Contractor/Educator At Oakland Unified School District
Position:
Promotions Officer at Golden Fetus Records, Artist In Residence at Ensemble Mik Nawooj, Independent Contractor/Educator at Oakland Unified School District
Location:
San Francisco Bay Area
Industry:
Program Development
Work:
Golden Fetus Records
since Aug 2013
-
Promotions Officer
Ensemble Mik Nawooj
- Oakland since Sep 2012
-
Artist In Residence
Oakland Unified School District
since Sep 2011
-
Independent Contractor/Educator
Education:
DeVry University-California 2013 - 2016
Bachelor's of Science, Engineering Technology - Computers
Bachelor's of Science, Engineering Technology - Computers
Accounting Professional
Location:
San Francisco Bay Area
Industry:
Accounting
Apparatus And Method For Obtaining Topographical Dark-Field Images In A Scanning Electron Microscope
US Patent:
7714287, May 11, 2010
Filed:
Aug 19, 2008
Appl. No.:
12/194153
Inventors:
Edward M. James - San Francisco CA, US
Ye Yang - Fremont CA, US
Mark Lin - San Jose CA, US
Alexander J. Gubbens - Redwood City CA, US
Paul Petric - Pleasanton CA, US
Ye Yang - Fremont CA, US
Mark Lin - San Jose CA, US
Alexander J. Gubbens - Redwood City CA, US
Paul Petric - Pleasanton CA, US
Assignee:
KLA-Tencor Corporation - San Jose CA
International Classification:
H01J 49/08, G01N 21/00, G01N 23/00
US Classification:
250310, 250306, 250307, 250396 R, 250397, 2504922
Abstract:
An electron beam apparatus is configured for dark field imaging of a substrate surface. Dark field is defined as an operational mode where the image contrast is sensitive to topographical features on the surface. A source generates a primary electron beam, and scan deflectors are configured to deflect the primary electron beam so as to scan the primary electron beam over the substrate surface whereby secondary and/or backscattered electrons are emitted from the substrate surface, said emitted electrons forming a scattered electron beam. A beam separator is configured to separate the scattered electron beam from the primary electron beam. The apparatus includes a cooperative arrangement which includes at least a ring-like element, a first grid, and a second grid. The ring-like element and the first and second grids each comprises conductive material. A segmented detector assembly is positioned to receive the scattered electron beam after the scattered electron beam passes through the cooperative arrangement.
Angle Resolved X-Ray Detection
US Patent:
7075073, Jul 11, 2006
Filed:
May 21, 2004
Appl. No.:
10/851437
Inventors:
Gary R. Janik - Palo Alto CA, US
Jeffrey A. Moore - San Jose CA, US
Edward M. James - San Francisco CA, US
Jeffrey A. Moore - San Jose CA, US
Edward M. James - San Francisco CA, US
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
G21K 1/02
US Classification:
250310, 250306, 2505051, 378 70, 378 72, 378147
Abstract:
An apparatus for detecting properties of a sample. An electron beam generator produces an electron beam and directs the electron beam at a desired point on the sample. The sample thereby emits characteristic x-rays at takeoff angles. A collimator receives and parallelizes the x-rays and converts the takeoff angles of the x-rays to positional differences between the parallelized x-rays. A diffractor receives and deflects the x-rays. A position sensitive detector receives the deflected x-rays and detects the positional differences between the x-rays, and generates signals that are characteristic of the received x-rays. An analyzer receives the signals from the detector and determines the properties of the sample based at least in part on the positional differences between the x-rays.
Site Stepping For Electron Beam Micro Analysis
US Patent:
7115866, Oct 3, 2006
Filed:
Apr 28, 2005
Appl. No.:
11/116617
Inventors:
Roger Kroeze - San Francisco CA, US
David A. Soltz - San Jose CA, US
David A. Crewe - Sunnyvale CA, US
Gregory W. Grant - San Jose CA, US
Chiyan Kuan - Danville CA, US
Thierry H. C. Nguyen - Sunnyvale CA, US
Salvatore T. Fahey - Oakland CA, US
Edward M. James - San Francisco CA, US
David A. Soltz - San Jose CA, US
David A. Crewe - Sunnyvale CA, US
Gregory W. Grant - San Jose CA, US
Chiyan Kuan - Danville CA, US
Thierry H. C. Nguyen - Sunnyvale CA, US
Salvatore T. Fahey - Oakland CA, US
Edward M. James - San Francisco CA, US
Assignee:
KLA-Tencor Technologies, Inc. - Milpitas CA
International Classification:
G21K 7/00, G01N 23/00
US Classification:
250310, 250306, 250307, 250311
Abstract:
A method of measuring properties of a sample using an electron beam. Coordinates of a measurement site on the sample, and a diameter of the electron beam are defined. Multiple measurement locations are determined within the measurement site, using the coordinates of the measurement site and the diameter of the electron beam. The measurement locations are selected such that the electron beam when directed at the multiple measurement locations (either through beam deflection or sample movement) substantially covers the measurement site. The electron beam is directed to the measurement locations and properties of the sample are measured at each of the measurement locations.