CINDY CHEN, MD
Emergency Medical Service at Bascom Ave, San Jose, CA

License number
California A45248
Category
Emergency Medical Service
Type
Personal Emergency Response Attendant
Address
Address 2
3880 S Bascom Ave SUITE 208, San Jose, CA 95124
5729 Gold Creek Dr, Hayward, CA 94552
Phone
(408) 377-8100
(510) 581-5541

Personal information

See more information about CINDY CHEN at radaris.com
Name
Address
Phone
Cindy Chen
45 Ross Aly APT 23, San Francisco, CA 94108
Cindy Chen
43 Lee Ave, San Francisco, CA 94112
Cindy Chen
417 N Mcpherrin Ave #A, Monterey Park, CA 91754
Cindy Chen
415 N Nicholson Ave APT 3, Monterey Park, CA 91755
Cindy Chen
421 Hershner Dr, Los Gatos, CA 95032

Organization information

See more information about CINDY CHEN at bizstanding.com

Cindy Chen MD

5729 Gold Crk Dr, Castro Valley, CA 94552

Categories:
Physicians & Surgeons
Phone:
(510) 581-5541 (Phone)

Professional information

Cindy Chen Photo 1

Senior Research Associate At Lawrence Berkeley National Laboratory (Jgi)

Position:
Senior Research Associate at Lawrence Berkeley National Laboratory (JGI)
Location:
San Francisco Bay Area
Industry:
Biotechnology
Work:
Lawrence Berkeley National Laboratory (JGI) - Walnut Creek, CA since Jul 2012 - Senior Research Associate Illumina - Hayward, CA Sep 2010 - Oct 2012 - Scientist, Gene Expression Applications Illumina - Hayward, CA Jul 2009 - Sep 2010 - Associate Scientist, Tech Transfer Consumables Illumina - Hayward, CA Mar 2008 - Jul 2009 - Staff QC Analyst Perlegen Sciences - Mountain View, CA Apr 2001 - Mar 2008 - Senior Research Associate Affymetrix - Santa Clara, CA Jul 1997 - Mar 2001 - Research Associate II, , Santa Clara, CA (12/15/1997-3/30/2001) Dept. of Physiology, MCP-Hahneman - Philadelphia, PA Aug 1995 - May 1997 - Research Specialist, ,, Philadelphia 1995-1997 Dept. of Biology, Syracuse University - Syracuse, NY Feb 1994 - Aug 1995 - Research Specialist 1994-1995 Biophysics Program, Syracuse University - Syracuse, NY Aug 1990 - Feb 1994 - Research Assistant, 1990-1994
Education:
South China Normal University, Guangzhou, P.R. of China
BS, Biology
Syracuse University, Syracuse, NY
Skills:
Assay Development, Genomics, DNA, PCR, RT-PCR, DNA sequencing, Genotyping, Protein Purification, Molecular Biology, Biotechnology, qPCR, Lifesciences, Sequencing, Purification, Technology Transfer, Bioinformatics, Genetics, Functional Genomics, Biochemistry


Cindy Chen Photo 2

Cindy Chen - San Jose, CA

Work:
VMware Inc
Sr. Manager, Digital Web Marketing Analytics
Intel Corporation - McAfee - Santa Clara, CA
Sr. Web Analytics Analyst
Cisco Systems - San Jose, CA
Sr. Web Metrics Analyst
Monolithic Power Systems - San Jose, CA
Marketing Communications Specialist
Google Inc - Mountain View, CA
Content Acquisition Assistant, Engineering Search Quality
Google Inc - Mountain View, CA
AdWords Coordinator
Education:
University of California - San Diego, CA
B.S. in Business Management Science
Skills:
Software: Omniture Insights, Omniture SiteCatalyst (web-based reporting, data warehouse, Excel Clients, Clickmap), Omniture Test and Target, Web Analytics Unica NetInsight, Clickstream, Microsoft Word, Excel, PowerPoint, Visio, Dream weaver, Fireworks, Photoshop, and Illustrator Program Languages: HTML, MySQL


Cindy Chen Photo 3

Dr. Cindy Chen, San Jose CA - MD (Doctor of Medicine)

Specialties:
Neonatal Medicine
Address:
3880 S Bascom Ave SUITE 208, San Jose 95124
(408) 377-8100 (Phone), (408) 377-3044 (Fax)
Certifications:
Pediatrics, 1987, Perinatal Medicine & Neonatal Medicine, 1997
Awards:
Healthgrades Honor Roll
Languages:
English
Hospitals:
3880 S Bascom Ave SUITE 208, San Jose 95124
Good Samaritan Hospital
2425 Samaritan Dr, San Jose 95124
Education:
Medical School
National Taiwan University
Natl Taiwan U Hosp
Ochsner Medical Center
Jackson Meml Hosp/U Miami


Cindy I Chen Photo 4

Cindy I Chen, San Jose CA

Specialties:
Neonatal-Perinatal Medicine Specialist
Address:
3880 S Bascom Ave, San Jose, CA 95124
4920 Barranca Pkwy, Irvine, CA 92604
2425 Samaritan Dr, San Jose, CA 95124


Cindy Chen Photo 5

Methods For Post Polysilicon Etch Photoresist And Polymer Removal With Minimal Gate Oxide Loss

US Patent:
6955177, Oct 18, 2005
Filed:
Dec 7, 2001
Appl. No.:
10/011497
Inventors:
Eddie Chiu - Pleasanton CA, US
Cindy Wailam Chen - San Jose CA, US
Wesley Phillip Graff - Austin TX, US
Assignee:
Novellus Systems, Inc. - San Jose CA
International Classification:
B08B007/00, B08B007/04
US Classification:
134 12, 134 11, 134 26
Abstract:
The present invention pertains to methods for cleaning semiconductor wafers, more specifically, for removing polymeric and other residues from a wafer using dry plasmas generated with microwave (MW), electromagnetic field (inductively-coupled plasma (ICP)), and radio frequency (RF) energy. First, a wafer is treated by applying a microwave-generated plasma or an inductively-coupled plasma. Second, a radio frequency generated plasma is applied. Each of the microwave-generated plasma and the inductively-coupled plasma is produced from a gas mixture, which includes an oxygen source gas, a fluorine source gas, and a hydrogen source gas. Using such plasmas provides more controllable etch rates than conventional plasmas via control of fluorine concentration in the plasma. Application of a radio frequency generated (preferably oxygen-based) plasma is used for additional photoresist and polymer removal. The use of this two-step approach provides superior wafer cleaning compared to conventional wet and dry clean methods.


Cindy Chen Photo 6

Etch Back Process Approach In Dual Source Plasma Reactors

US Patent:
7160813, Jan 9, 2007
Filed:
Nov 12, 2002
Appl. No.:
10/293661
Inventors:
Cindy W. Chen - San Jose CA, US
Eddie Chiu - Pleasanton CA, US
Mavis J. Chaboya - San Jose CA, US
Assignee:
Novellus Systems, Inc. - San Jose CA
International Classification:
H01L 21/302
US Classification:
438710, 438706, 438712, 15634535
Abstract:
A method is disclosed for removing a polysilicon layer from a semiconductor wafer, in which a downstream plasma source is used first to planarize the wafer, removing contours in the polysilicon layer caused by deposition over lithographic features, such as via holes. The planarizing process is followed by exposure to a plasma made by a direct, radio frequency plasma source, which may be in combination with the downstream plasma source, to perform the bulk etching of the polysilicon. The invention can produce planar surface topography after the top layer of the film is removed, in which the residual recess height of the polysilicon plug filling a via hole is less than about about 10 nm.