ZLATKO SITAR
Pilots at Greyhawk Pl, Apex, NC
License number
North Carolina C1008402
Category
Airmen
Address
Address
3001 Greyhawk Pl, Apex, NC 27539
Professional information
Passivation Of Aluminum Nitride Substrates
US Patent:
8148802, Apr 3, 2012
Filed:
Feb 16, 2011
Appl. No.:
13/028505
Inventors:
Ramon R. Collazo - Raleigh NC, US
Zlatko Sitar - Apex NC, US
Rafael Dalmau - Raleigh NC, US
Zlatko Sitar - Apex NC, US
Rafael Dalmau - Raleigh NC, US
Assignee:
North Carolina State University - Raleigh NC
International Classification:
H01L 23/58
US Classification:
257632, 257615, 257631
Abstract:
The present invention provides methods of protecting a surface of an aluminum nitride substrate. The substrate with the protected surface can be stored for a period of time and easily activated to be in a condition ready for thin film growth or other processing. In certain embodiments, the method of protecting the substrate surface comprises forming a passivating layer on at least a portion of the substrate surface by performing a wet etch, which can comprise the use of one or more organic compounds and one or more acids. The invention also provides aluminum nitride substrates having passivated surfaces.
Passivation Of Aluminum Nitride Substrates
US Patent:
7915178, Mar 29, 2011
Filed:
Jul 30, 2008
Appl. No.:
12/182475
Inventors:
Ramon R. Collazo - Raleigh NC, US
Zlatko Sitar - Apex NC, US
Rafael Dalmau - Raleigh NC, US
Zlatko Sitar - Apex NC, US
Rafael Dalmau - Raleigh NC, US
Assignee:
North Carolina State University - Raleigh NC
International Classification:
H01L 21/31, H01L 21/469
US Classification:
438765, 438694, 438745, 438767
Abstract:
The present invention provides methods of protecting a surface of an aluminum nitride substrate. The substrate with the protected surface can be stored for a period of time and easily activated to be in a condition ready for thin film growth or other processing. In certain embodiments, the method of protecting the substrate surface comprises forming a passivating layer on at least a portion of the substrate surface by performing a wet etch, which can comprise the use of one or more organic compounds and one or more acids. The invention also provides aluminum nitride substrates having passivated surfaces.