YANG LI
Acupuncture at Southwest Expy, San Jose, CA
License number
California AC17573
Category
Acupuncture
Type
Acupuncturist
Address
Address
1520 Southwest Expy SOUTHWEST UNIT 141, San Jose, CA 95126
Phone
(408) 889-3998
Personal information
See more information about YANG LI at radaris.comName
Address
Phone
4457 Seminole Way, Pleasanton, CA 94588
4709 Williams Rd, San Jose, CA 95129
400 Ortega Ave APT 209, Mountain View, CA 94040
4125 Walnut Grove Ave, Rosemead, CA 91770
545 Shell Pkwy APT 3101, Redwood City, CA 94065
Professional information
Yang Li - San Jose, CA
Work:
KLA-Tencor Corporation
Product Development Engineer, SWIFT/ GSS division Applied Materials - Santa Clara, CA
Capital Improvement Project Engineer Intern, Display division
Product Development Engineer, SWIFT/ GSS division Applied Materials - Santa Clara, CA
Capital Improvement Project Engineer Intern, Display division
Method For Manufacturing A Magnetic Read Sensor With Narrow Track Width Using Amorphous Carbon As A Hard Mask And Localized Cmp
US Patent:
8617408, Dec 31, 2013
Filed:
Oct 18, 2011
Appl. No.:
13/275728
Inventors:
Hamid Balamane - Portola Valley CA, US
Patrick M. Braganca - San Jose CA, US
Jordan A. Katine - Mountain View CA, US
Jui-Lung Li - San Jose CA, US
Yang Li - San Jose CA, US
Kanaiyalal C. Patel - Fremont CA, US
Neil L. Robertson - Palo Alto CA, US
Samuel W. Yuan - Saratoga CA, US
Patrick M. Braganca - San Jose CA, US
Jordan A. Katine - Mountain View CA, US
Jui-Lung Li - San Jose CA, US
Yang Li - San Jose CA, US
Kanaiyalal C. Patel - Fremont CA, US
Neil L. Robertson - Palo Alto CA, US
Samuel W. Yuan - Saratoga CA, US
Assignee:
HGST Netherlands B.V. - Amsterdam
International Classification:
B44C 1/22
US Classification:
216 22, 216 62, 216 67, 2960301, 2960314
Abstract:
A method for manufacturing a magnetic read sensor at very narrow track widths. The method uses an amorphous carbon mask layer to pattern the sensor by ion milling, rather than a mask constructed of a material such as photoresist or DURIMIDE® which can bend over during ion milling at very narrow track widths. By using the amorphous carbon layer as the masking layer, the trackwidth can be very small, while avoiding this bending over of the mask that has been experienced with prior art methods. In addition, the track-width can be further reduced by using a reactive ion etching to further reduce the width of the amorphous carbon mask prior to patterning the sensor. The method also allows extraneous portions of the side insulation layer and hard bias layer to be removed above the sensor by a light CMP process.