YAN Y XIA, LIC. AC.
Acupuncture at Kneeland St, Boston, MA
License number
Massachusetts 429
Category
Acupuncture
Type
Acupuncturist
Address
Address
2
72 Kneeland St ROOM 303, Boston, MA 02111
35 Ocean St, Quincy, MA 02171
35 Ocean St, Quincy, MA 02171
Phone
(617) 432-1335
Personal information
See more information about YAN Y XIA at radaris.comName
Address
Phone
35 Ocean St, Quincy, MA 02171
35 Ocean St, Quincy, MA 02171
175 Adams St, Newton, MA 02458
Quincy, MA
Professional information
Yan Y Xia, Boston MA - LICAC
Specialties:
Acupuncture
Address:
72 Kneeland St SUITE 303, Boston 02111
(617) 432-1335 (Phone)
(617) 432-1335 (Phone)
Languages:
English
Periodic Nanostructures From Self Assembled Wedge-Type Block-Copolymers
US Patent:
2013029, Nov 7, 2013
Filed:
Mar 13, 2013
Appl. No.:
13/801710
Inventors:
Yan XIA - Quincy MA, US
Benjamin R. SVEINBJORNSSON - Pasadena CA, US
Robert H. GRUBBS - South Pasadena CA, US
Raymond WEITEKAMP - Pasadena CA, US
Garrett M. MIYAKE - Pasadena CA, US
Christopher Scot DAEFFLER - Pasadena CA, US
Benjamin R. SVEINBJORNSSON - Pasadena CA, US
Robert H. GRUBBS - South Pasadena CA, US
Raymond WEITEKAMP - Pasadena CA, US
Garrett M. MIYAKE - Pasadena CA, US
Christopher Scot DAEFFLER - Pasadena CA, US
International Classification:
C08F 293/00, C08F 299/00
US Classification:
525 89, 525280
Abstract:
The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.
Rapid Self-Assembly Of Block Copolymers To Photonic Crystals
US Patent:
2013032, Dec 5, 2013
Filed:
Mar 13, 2013
Appl. No.:
13/800646
Inventors:
Yan XIA - Quincy MA, US
Benjamin R SVEINBJORNSSON - Pasadena CA, US
Robert H GRUBBS - South Pasadena CA, US
Raymond WEITEKAMP - Glendale CA, US
Garret M MIYAKE - Pasadena CA, US
Harry A ATWATER - South Pasadena CA, US
Christopher Scot DAEFFLER - Pasadena CA, US
Benjamin R SVEINBJORNSSON - Pasadena CA, US
Robert H GRUBBS - South Pasadena CA, US
Raymond WEITEKAMP - Glendale CA, US
Garret M MIYAKE - Pasadena CA, US
Harry A ATWATER - South Pasadena CA, US
Christopher Scot DAEFFLER - Pasadena CA, US
International Classification:
C08G 81/02
US Classification:
525182
Abstract:
The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.