WESLEY C. BLOCKER, MD
Osteopathic Medicine at Hennessy Blvd, Baton Rouge, LA

4997869, Mar 5, 1991

Oct 11, 1988

7/255747

Allan A. Eisenbraun - Baton Rouge LA
Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

H01L 2100, H01L 2102, G03C 168

524104

In humid atmospheres (e. g. , 40% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis[4-(aminophenoxy)phenyl]hexafluoropropane polyimides tend to be unstable in the sense that during spin coating operations undesirable precipitate formation occurs on the rotating surface of the wafer. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described are solutions of these polyimide polymers in a solvent containing one or more liquid aromatic hydrocarbons having a boiling point of at least about 110. degree. C. and one or more dipolar aprotic solvents having a boiling point of at least about 150. degree. C. , such that the solution (a) contains on a weight basis from about 5% to about 50% of the polyimide, and (b) does not undergo precipitate formation during spin coating in an atmosphere of at least up to about 55% relative humidity.

5037673, Aug 6, 1991

Sep 21, 1990

7/586192

Allan A. Eisenbraun - Baton Rouge LA
Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

B05D 312

427240

In humid atmospheres (e. g. , 55% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis[4-(aminophenoxy)phenyl]hexafluoropropane polyamic acid polymers tend to be unstable in the sense that during spin coating operations undesirable precipitate formation may occur on the rotating surface of a semiconductor wafer. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described is a method of spin coating solutions of these polyamic acid polymers in a solvent containing one or more cycloaliphatic ketones, such that the solution (a) contains on a weight basis from about 5% to about 40% of the polyamic acid and (b) does not undergo precipitate formation during spin coating in an atmosphere of up to at least about 55% relative humidity.

4956451, Sep 11, 1990

Oct 11, 1988

7/255260

Allan A. Eisenbraun - Baton Rouge LA
Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

C08G 6926, C08G 1200, B05D 302, B05D 312

528353

In humid atmospheres (e. g. , 40% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis[4-(aminophenoxy)phenyl]hexafluoropropane polyimides tend to be unstable in the sense that during spin coating operations undesirable precipitate formation occurs on the rotating surface of the water. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described are compositions especially adapted for use in spin coating wafers of semiconductive materials, which comprise solutions of these polyimide polymers in a solvent containing at least 10% of a cycloaliphatic ketone (e. g. , cyclohexanone) or mixture of cycloaliphatic ketones, such that the solution (a) contains on a weight basis from about 5% to about 50% of the polyimide, and (b) does not undergo precipitate formation during spin coating in an atmosphere of up to at least about 55% relative humidity.

4950734, Aug 21, 1990

Oct 11, 1988

7/255610

Allan A. Eisenbraun - Baton Rouge LA
Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

C08G 6926, C08G 1200, B05D 302, B05D 312

528353

In humid atmospheres (e. g. , 55% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis[4-(aminophenoxy)phenyl]hexafluoropropane polyamic acid polymers tend to be unstable in the sense that during spin coating operations undesirable precipitate formation may occur on the rotating surface of a semiconductor wafer. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described are solutions of these polyamic acid polymers in a solvent containing at least 40% by weight of one or more liquid aromatic hydrocarbons having a boiling point of at least about 110. degree. C. and at least 5% by weight of one or more dipolar aprotic solvents having a boiling point of at least about 150. degree. C. , such that the solution (a) contains on a weight basis from about 5% to about 40% of the polyamic acid and (b) does not undergo precipitate formation during spin coating in an atmosphere of up to at least about 55% relative humidity.

5068131, Nov 26, 1991

Sep 13, 1990

7/581911

Allan A. Eisenbraun - Baton Rouge LA
Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

B05D 312

427240

In humid atmospheres (e. g. , 40% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis[4-(aminophenoxy)phenyl]hexafluoropropane polyimides tend to be unstable in the sense that during spin coating operations undesirable precipitate formation occurs on the rotating surface of the wafer. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described are solutions of these polyimide polymers in a solvent containing one or more liquid aromatic hydrocarbons having a boiling point at least about 110. degree. C. and one or more dipolar aprotic solvents having a boiling point of at least about 150. degree. C. , such that the solution (a) contains on a weight basis from about 5% to about 50% of the polyimide, and (b) does not undergo precipitate formation during spin coating in an atmosphere of up to about 55% relative humidity.

5006370, Apr 9, 1991

Jun 22, 1990

7/542015

Allan A. Eisenbraun - Baton Rouge LA
Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

B05D 512, H01L 21469

427240

In humid atmospheres (e. g. , 55% relative humidity or above) solutions of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride/2,2-bis [4-(aminophenoxy)phenyl]hexafluoropropane polyamic acid polymers tend to be unstable in the sense that during spin coating operations undesirable precipitate formation may occur on the rotating surface of a semiconductor wafer. The result is the formation of unacceptable coatings due to their irregularity and lack of uniformity. Described are solutions of these polyamic acid polymers in a solvent containing at least 40% by weight of one or more liquid aromatic hydrocarbons having a boiling point of at least about 110. degree. C. and at least 5% by weight of one or more dipolar aprotic solvents having a boiling point of at least about 150. degree. C. , such that the solution (a) contains on a weight basis from about 5% to about 40% of the polyamic acid and (b) does not undergo precipitate formation during spin coating in an atmosphere of up to at least about 55% relative humidity.

5112942, May 12, 1992

Sep 26, 1990

7/588280

Wesley C. Blocker - Baton Rouge LA

Ethyl Corporation - Richmond VA

C08G 6926, C08G 6928, C08G 802, C08G 1400

528353

Copolyimides and their precursors are disclosed comprising units represented by the formula ##STR1## where R. sub. 1, R. sub. 2, R. sub. 3 and R. sub. 4 are the same or different and are hydrogen or C. sub. 1 to C. sub. 6 linear or branched alkyl, with the proviso that R. sub. 1, R. sub. 2, R. sub. 3 and R. sub. 4 cannot simultaneously be hydrogen and where Z is a chemical bond, ##STR2## Ar is the tetravalent residue of a tetracarboxylic acid or acid dianhydride or di- or tetraester thereof, where x and y are integers from about 100 to about 1,000, and the ratio of x to y is from about 1:99 to about 49:51, and z is 0-5. These copolymers have improved resistance to stress cracking. They may also be used in applications such as coatings, or adhesives.

4927896, May 22, 1990

Jul 3, 1989

7/375034

Wesley C. Blocker - Baton Rouge LA
David N. Roark - Baton Rouge LA
Edwin D. Hornbaker - Baton Rouge LA

Ethyl Corporation - Richmond VA

C08F 216, C08F 2602

526 93

A water-soluble salt of monoallylamine is polymerized in an aqueous reaction medium at a temperature of about 30. degree. -80. degree. C. in the presence of a polymerization initiator comprising about 3-15% by weight of hydrogen peroxide and about 1-700 ppm of a multi-valent metal ion, based on the weight of the monomer charge. The hydrogen peroxide is preferably introduced continuously or periodically during a substantial portion of the polymerization reaction. Preferred sources of the metal ion are water-soluble iron salts, such as ferric or ferrous chloride.