VIJAY K BASRA
Broker in Reading, MA

License number
Massachusetts 9061840
Issued Date
Mar 6, 2004
Expiration Date
Sep 15, 2010
Type
Salesperson
Address
Address
Reading, MA 01867

Professional information

Vijay Basra Photo 1

Process For Producing Magnetic Recording Head Poles Utilizing Sputtered Materials And A Recording Head Made Thereby

US Patent:
6500351, Dec 31, 2002
Filed:
May 24, 1999
Appl. No.:
09/317484
Inventors:
Andrew L. Wu - Shrewsbury MA
Jeffrey G. Greiman - Worcester MA
Lawrence G. Neumann - Lancaster MA
Vijay K. Basra - Reading MA
Assignee:
Maxtor Corporation - Longmont CO
International Classification:
C23F 1700
US Classification:
216 22, 216 75, 216100, 134 37, 438695, 438704, 438712, 427128, 427130, 427264, 427270, 427272
Abstract:
A recording head pole production process, and a pole made by the process, in which a combination of wet and dry etching steps are utilized to advantageously provide an undercut in the relatively high magnetic moment material beneath a photoresist area used to define the pole such that any re-deposited layer of material which occurs on the sides of the pole and photoresist area during the dry etching operation is advantageously rendered substantially discontinuous, or weakly linked, and the re-deposited material remaining on the pole itself following a photoresist strip can then be removed by being subjected to a stream of gaseous particles and ultimately carried away by the accompanying gas stream itself. In a particular embodiment disclosed herein the relatively high magnetic moment material may comprise a sputter deposited layer of cobalt-zirconium-tantalum (CoZrTa), iron-aluminum-nitride (FeAlN), iron-tantalum-nitride (FeTaN), iron-nitride (FeN) or similar materials. The stream of gaseous particles may be formed utilizing the expansion of a gaseous material, such as liquid carbon dioxide (CO ), through a nozzle directed at the re-deposited material remaining on the pole following the photoresist strip operation.


Vijay Basra Photo 2

Castellation Technique For Improved Lift-Off Of Photoresist In Thin-Film Device Processing And A Thin-Film Device Made Thereby

US Patent:
6524689, Feb 25, 2003
Filed:
Oct 28, 1999
Appl. No.:
09/429379
Inventors:
Vijay K. Basra - Reading MA
Lawrence G. Neumann - Lancaster MA
Assignee:
Quantum Corporation - Milpitas CA
International Classification:
C03F 700
US Classification:
428220, 428332, 428336, 430496
Abstract:
A castellation technique for improved lift-off of deposited thin film on photoresist in thin-film device processing of particular utility in the production of magnetic data transducers and recording heads. By correctly designing the edge boundary of a photoresist structure, enhanced regions of low resist edge bombardment and low deposit penetration may be achieved. These enhanced regions enable the lift-off of extra thick deposited regions that would not be otherwise achievable through the use of conventional techniques with and without castellation.


Vijay Basra Photo 3

Castellation Technique For Improved Lift-Off Of Photoresist In Thin-Film Device Processing And A Thin-Film Device Made Thereby

US Patent:
6716515, Apr 6, 2004
Filed:
Jan 16, 2003
Appl. No.:
10/346326
Inventors:
Vijay K. Basra - Reading MA
Lawrence G. Neumann - Lancaster MA
Assignee:
Quantum Corporation - San Jose CA
International Classification:
C03F 700
US Classification:
4281951, 428220, 428332, 430313, 430314, 430323, 430324, 430496
Abstract:
A castellation technique for improved lift-off of deposited thin film on photoresist in thin-film device processing of particular utility in the production of magnetic data transducers and recording heads. By correctly designing the edge boundary of a photoresist structure, enhanced regions of low resist edge bombardment and low deposit penetration may be achieved. These enhanced regions enable the lift-off of extra thick deposited regions that would not be otherwise achievable through the use of conventional techniques with and without castellation.


Vijay Basra Photo 4

Process For Producing Magnetic Head Poles Utilizing Sputtered Materials And A Recording Head Made Thereby

US Patent:
6685845, Feb 3, 2004
Filed:
Dec 31, 2002
Appl. No.:
10/335685
Inventors:
Andrew L. Wu - Shrewsbury MA
Jeffrey G. Greiman - Worcester MA
Lawrence G. Neumann - Lancaster MA
Vijay K. Basra - Reading MA
Assignee:
Maxtor Corporation - Longmont CO
International Classification:
B44C 122
US Classification:
216 22
Abstract:
A recording head pole production process, and a pole made by the process, in which a combination of wet and dry etching steps are utilized to advantageously provide an undercut in the relatively high magnetic moment material beneath a photoresist area used to define the pole such that any re-deposited layer of material which occurs on the sides of the pole and photoresist area during the dry etching operation is advantageously rendered substantially discontinuous, or weakly linked, and the re-deposited material remaining on the pole itself following a photoresist strip can then be removed by being subjected to a stream of gaseous particles and ultimately carried away by the accompanying gas stream itself. In a particular embodiment disclosed herein the relatively high magnetic moment material may comprise a sputter deposited layer of cobalt-zirconium-tantalum (CoZrTa), iron-aluminum-nitride (FeAlN), iron-tantalum-nitride (FeTaN), iron-nitride (FeN) or similar materials. The stream of gaseous particles may be formed utilizing the expansion of a gaseous material, such as liquid carbon dioxide (CO ), through a nozzle directed at the re-deposited material remaining on the pole following the photoresist strip operation.


Vijay Basra Photo 5

Multi-Step Stud Design And Method For Producing Closely Packed Interconnects In Magnetic Recording Heads

US Patent:
6375063, Apr 23, 2002
Filed:
Jul 16, 1999
Appl. No.:
09/354825
Inventors:
Vijay K. Basra - Reading MA
Lawrence G. Neumann - Lancaster MA
Assignee:
Quantum Corporation - Milpitas CA
International Classification:
G11B 5127
US Classification:
228215, 430312, 2960301, 360110
Abstract:
A multi-step stud design and method for fabricating the same of special utility for producing closely packed interconnects in magnetic recording heads, particularly higher density magnetoresistive and giant magnetoresistive tape heads. The multi-step stud fabrication process and structure enables the achievement of significantly higher interconnect densities resulting in an increased number of channels per millimeter on a single computer mass storage device recording head. A resultant stronger encapsulation surrounding the stud further provides increased channel reliability. The improved uniformity of the photoresist aperture achieved for each step in the stud structure, and lower current spreading resistance because of the wider underlying stud base size, increases stud uniformity resulting in improved stud yields. This increased yield compared with conventional single step stud processes reduces cost, even with the additional photolithography and plating processes involved.


Vijay Basra Photo 6

Optical Sensor To Recording Head Alignment

US Patent:
7023650, Apr 4, 2006
Filed:
Nov 7, 2001
Appl. No.:
10/037083
Inventors:
Vijay K. Basra - Reading MA, US
Leo Guglielmo - Ormond Beach FL, US
George Bellesis - Jefferson MA, US
Assignee:
Quantum Corporation - San Jose CA
International Classification:
G11B 5/584
US Classification:
360 7712, 360122
Abstract:
A technique of positioning a recording head relative to an optical servo system in a magnetic recording tape system read/write assembly is described. The technique includes positioning an optical sensor of the optical servo system at a first position relative to a selected one of recording channels on the recording head and positioning the optical sensor at a second position relative to the selected recording channel using an alignment target on the recording head. A recording head in a read/write assembly of a magnetic recording tape system is also described. The recording head includes recording channels fabricated on a wafer and an alignment target affixed to the wafer between a first read-write element of a recording channel and a second read-write element of the recording channel, the alignment target fabricated to produce an optical reflectance signal.


Vijay Basra Photo 7

Magnetic Read/Write Head

US Patent:
2006015, Jul 13, 2006
Filed:
Mar 6, 2006
Appl. No.:
11/369427
Inventors:
Vijay Basra - Reading MA, US
Lawrence Neumann - Lancaster MA, US
Zhenghao Liu - Framingham MA, US
Assignee:
Quantum Corporation - Milpitas CA
International Classification:
G11B 5/187
US Classification:
029603010, 029603070, 029603110, 029605000, 360122000
Abstract:
A magnetic head for use with a magnetic recording medium includes a top write pole for use in recording information on the magnetic recording medium, and a solenoidal coil structure having a lower coil layer disposed below the top write pole and an upper coil layer disposed above the top write pole. The upper coil layer and the lower coil layer are insulated from the top write pole. The magnetic head also includes a vertical interconnect structure connecting the lower coil layer to the upper coil layer.


Vijay Basra Photo 8

Magnetic Read/Write Head

US Patent:
2004008, May 6, 2004
Filed:
Nov 5, 2002
Appl. No.:
10/289120
Inventors:
Vijay Basra - Reading MA, US
Lawrence Neumann - Lancaster MA, US
Zhenghao Liu - Framingham MA, US
International Classification:
G11B005/39, G11B005/127
US Classification:
360/317000, 360/126000, 360/123000, 029/603180
Abstract:
A magnetic head for use with a magnetic recording medium includes a top write pole for use in recording information on the magnetic recording medium, and a solenoidal coil structure having a lower coil layer disposed below the top write pole and an upper coil layer disposed above the top write pole. The upper coil layer and the lower coil layer are insulated from the top write pole. The magnetic head also includes a vertical interconnect structure connecting the lower coil layer to the upper coil layer