Inventors:
Andrew L. Wu - Shrewsbury MA
Jeffrey G. Greiman - Worcester MA
Lawrence G. Neumann - Lancaster MA
Vijay K. Basra - Reading MA
Assignee:
Maxtor Corporation - Longmont CO
International Classification:
C23F 1700
US Classification:
216 22, 216 75, 216100, 134 37, 438695, 438704, 438712, 427128, 427130, 427264, 427270, 427272
Abstract:
A recording head pole production process, and a pole made by the process, in which a combination of wet and dry etching steps are utilized to advantageously provide an undercut in the relatively high magnetic moment material beneath a photoresist area used to define the pole such that any re-deposited layer of material which occurs on the sides of the pole and photoresist area during the dry etching operation is advantageously rendered substantially discontinuous, or weakly linked, and the re-deposited material remaining on the pole itself following a photoresist strip can then be removed by being subjected to a stream of gaseous particles and ultimately carried away by the accompanying gas stream itself. In a particular embodiment disclosed herein the relatively high magnetic moment material may comprise a sputter deposited layer of cobalt-zirconium-tantalum (CoZrTa), iron-aluminum-nitride (FeAlN), iron-tantalum-nitride (FeTaN), iron-nitride (FeN) or similar materials. The stream of gaseous particles may be formed utilizing the expansion of a gaseous material, such as liquid carbon dioxide (CO ), through a nozzle directed at the re-deposited material remaining on the pole following the photoresist strip operation.