VERNON EDWARD YOST
Pilots at Reed Ct, Denver, CO
License number
Colorado A2898170
Issued Date
Apr 2015
Expiration Date
Apr 2016
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
1860 S Reed Ct, Denver, CO 80232
Professional information
Vernon Yost - Lakewood, CO
Work:
Suntek, Inc. - Albuquerque, NM
Polymer Research Chemist National Renewable Energy Laboratories (NREL) - Golden, CO
Senior Research Technician-Silicon Materials & Devices (NCPV) ADA TECHNOLOGIES INC - Littleton, CO
Research Chemist American Radio-Labeled Chemicals - St. Louis, MO
Independent Analytical/Synthetic Contractor MERIDIAN VINEYARDS - Paso Robles, CA
Senior Wine Chemist / QA QC Manager UCHSC SCHOOL OF MEDICINE - Denver, CO
Senior Professional Research Assistant environmental, petrochemical and semi-conductor industries
1998 consisted of supervisory positions relating
Polymer Research Chemist National Renewable Energy Laboratories (NREL) - Golden, CO
Senior Research Technician-Silicon Materials & Devices (NCPV) ADA TECHNOLOGIES INC - Littleton, CO
Research Chemist American Radio-Labeled Chemicals - St. Louis, MO
Independent Analytical/Synthetic Contractor MERIDIAN VINEYARDS - Paso Robles, CA
Senior Wine Chemist / QA QC Manager UCHSC SCHOOL OF MEDICINE - Denver, CO
Senior Professional Research Assistant environmental, petrochemical and semi-conductor industries
1998 consisted of supervisory positions relating
Education:
UNIVERSITY OF COLORADO - Denver, CO
Master of Science in Chemistry University of Colorado at Denver - Denver, CO
BA, Cum Laude, ACS accredited in Chemistry
Master of Science in Chemistry University of Colorado at Denver - Denver, CO
BA, Cum Laude, ACS accredited in Chemistry
Skills:
Computer Skills: MS Office, Excel, PowerPoint, HYSIS chemical engineering process simulation software, Visio & AutoCAD drafting software. Lab-View, Igor Pro data acquisition packages. MS Hardware experience: Perkin-Elmer Voyager MALDI-TOF, Applied Biosystems SCIEX API HPLC/MS/MS, Agilent GC/MS [] Quadrupoles, Bruker Ion-Trap, Magnetic Sector & TOF analyzers, VG-SIMS systems. Optical analysis: Varian UV-vis with spherical angular reflectance modules, Ocean-Optics photo diode array UV-vis, BioRad FTIR, Zeiss & Wyko Optical Microscopy & Jeol SEM. ICP-MS/OES systems: Varian, Agilent & Thermo-Jarrel-Ash. GC detectors: SCD (sulfur chemiluminescence), FID, TCD. Hall-ELCD, ECD, HID & DID. Mettler Auto-electrochemical Titrators, Hitachi Biochemical Clinical UV-vis assay systems. HPLC equipment: Agilent, 1050 & 1100, Gilson & Shimadzu analytical and preparative HPLC.
Anti-Reflection Etching Of Silicon Surfaces Catalyzed With Ionic Metal Solutions
US Patent:
2009023, Sep 24, 2009
Filed:
Mar 21, 2008
Appl. No.:
12/053445
Inventors:
VERNON YOST - LAKEWOOD CO, US
HOWARD BRANZ - BOULDER CO, US
HOWARD BRANZ - BOULDER CO, US
Assignee:
MIDWEST RESEARCH INSTITUTE - KANSAS CITY MO
International Classification:
C03C 25/68
US Classification:
216 99
Abstract:
A method () for etching a silicon surface (). The method () includes positioning () a substrate () with a silicon surface () into a vessel (). The vessel () is filled () with a volume of an etching solution () so as to cover the silicon surface (). The etching solution () includes a catalytic solution () and an oxidant-etchant solution (), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The catalytic solution () may be a solution that provides metal-containing molecules or ionic species of catalytic metals. The silicon surface () is etched () by agitating the etching solution () in the vessel () such as with ultrasonic agitation, and the etching may include heating () the etching solution () and directing light () onto the silicon surface (). During the etching, the catalytic solution (), such as a dilute solution of chorauric acid, in the presence of the oxidant-etchant solution () may release metal particles such as gold or silver nanoparticles that speed or drive the etching process.
Wet-Chemical Systems And Methods For Producing Black Silicon Substrates
US Patent:
2013023, Sep 12, 2013
Filed:
Nov 11, 2010
Appl. No.:
13/825541
Inventors:
Vernon Yost - Lakewood CO, US
Hao-Chih Yuan - Golden CO, US
Matthew Page - Golden CO, US
Hao-Chih Yuan - Golden CO, US
Matthew Page - Golden CO, US
Assignee:
ALLIANCE FOR SUSTANABLE ENERGY, LLC - Golden CO
International Classification:
H01L 21/306
US Classification:
2525011, 438753
Abstract:
A wet-chemical method of producing a black silicon substrate. The method comprising soaking single crystalline silicon wafers in a predetermined volume of a diluted inorganic compound solution. The substrate is combined with an etchant solution that forms a uniform noble metal nanoparticle induced Black Etch of the silicon wafer, resulting in a nanoparticle that is kinetically stabilized. The method comprising combining with an etchant solution having equal volumes acetonitrile/acetic acid:hydrofluoric acid:hydrogen peroxide.