Vernon Duane Pilcher
Engineers in Kirtland, NM

License number
Colorado 11344
Issued Date
Sep 30, 1972
Renew Date
Aug 1, 2010
Expiration Date
Oct 31, 2013
Type
Professional Engineer
Address
Address
PO Box 556, Kirtland, NM 87417

Professional information

Vernon Pilcher Photo 1

System For Treating Gaseous Streams Using Metamorphosed Mineral Compositions Having Internal Lattice Defects

US Patent:
7442343, Oct 28, 2008
Filed:
Dec 1, 2004
Appl. No.:
11/001482
Inventors:
Bruce Salisbury - Farmington NM, US
Vernon D. Pilcher - Kirtland NM, US
Assignee:
Pinnacle West Capital Corporation - Phoenix AZ
International Classification:
A62B 7/08
US Classification:
422122, 422120
Abstract:
Compositions formed in accordance with a method of controllably altering the mineral matter transformation of mineral compositions such as, for example, vermiculitic micas, to achieve metamorphosed mineral compositions having specifically desired monatomic lattice defects are provided that exhibit physical properties desirable in a variety of industrial applications, including, for example, control and/or reduction of NO, SO, COand other gaseous chemical species from industrial effluents, atmospheric control systems, fabrication and use of chemical detectors, and solid state electronic substrates and devices.


Vernon Pilcher Photo 2

Metamorphosed Mineral Compositions Having Internal Lattice Defects And Methods Of Making And Using Same

US Patent:
2003009, May 22, 2003
Filed:
Nov 5, 2002
Appl. No.:
10/288014
Inventors:
Bruce Salisbury - Farmington NM, US
Vernon Pilcher - Kirtland NM, US
Assignee:
Pinnacle West - Phoenix AZ
International Classification:
C04B014/20
US Classification:
106/417000
Abstract:
A method of controllably altering the mineral matter transformation of mineral compositions such as, for example, vermiculitic micas, to achieve metamorphosed mineral compositions having specifically desired monatomic lattice defects is provided. Compositions formed in accordance with the method are also provided that exhibit physical properties desirable in a variety of industrial applications, including, for example, control and/or reduction of NO, SO, COand other gaseous chemical species from industrial effluents, atmospheric control systems, fabrication and use of chemical detectors, and solid state electronic substrates and devices.