Inventors:
Tuyen V. Nguyen - Minneapolis MN, US
Andrey V. Zagrebelny - Eagan MN, US
Gregg E. Robinson - Eagan MN, US
Assignee:
Cypress Semiconductor Corporation - San Jose CA
International Classification:
H01L 21302
Abstract:
A method of making a semiconductor structure includes determining a polish time which is sufficient to planarize a layer on a semiconductor substrate. The layer is polished for the polish time to planarize the layer, and then the layer is polished to a predetermined thickness. The semiconductor structures can be used to make a semiconductor device.