Inventors:
Daniel Alvarez - San Diego CA, US
Troy B. Scoggins - San Diego CA, US
Tran Doan Nguyen - San Diego CA, US
Yasushi Ohyashiki - Chiba, JP
International Classification:
B01D 53/02, C01B 25/06, C01B 3/56, C01B 33/04, C01B 35/02, C01B 6/34
Abstract:
The invention is a method and apparatus for removing metal compounds from ultra-high purity gases using a purifier material comprising a high surface area inorganic oxide, so that the metals do not deposit on a sensitive device and cause device failure.