TATE SCOTT PICARD
Pilots at Jones Hl Rd, Enfield, NH

License number
New Hampshire A4198704
Issued Date
Apr 2015
Expiration Date
Apr 2017
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
162 Jones Hill Rd, Enfield, NH 03748

Professional information

Tate Picard Photo 1

Centralized Control Architecture For A Plasma Arc System

US Patent:
6772040, Aug 3, 2004
Filed:
Apr 10, 2000
Appl. No.:
09/546036
Inventors:
Tate S. Picard - Enfield NH
Roger E. Young - Canaan NH
Gregory S. Wilson - Newbury NH
Ronald M. Huppe - Windsor VT
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
G06F 1900
US Classification:
700166, 700174, 700175, 700165, 700117, 700108, 700160, 700170, 700178, 21912111, 21912155, 21912139, 21912149, 21912144, 21912156
Abstract:
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.


Tate Picard Photo 2

Centralized Control Architecture For A Plasma Arc System

US Patent:
6622058, Sep 16, 2003
Filed:
Apr 10, 2000
Appl. No.:
09/546155
Inventors:
Tate S. Picard - Enfield NH 03748
Roger E. Young - Canaan NH 03741
Gregory S. Wilson - Newbury NH 03255
Ronald M. Huppe - Windsor VT 05089
International Classification:
G06F 1900
US Classification:
700117, 700108, 700174, 21912155
Abstract:
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.


Tate Picard Photo 3

Centralized Control Architecture For A Plasma Arc System

US Patent:
6359251, Mar 19, 2002
Filed:
Apr 10, 2000
Appl. No.:
09/546470
Inventors:
Tate S. Picard - Enfield NH
Gregory S. Wilson - Newbury NH
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K 1000
US Classification:
21912157, 21912139, 21912144, 21912156
Abstract:
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.


Tate Picard Photo 4

Networking Architecture For Thermal Processing System

US Patent:
7709765, May 4, 2010
Filed:
Dec 28, 2005
Appl. No.:
11/321704
Inventors:
Tate S. Picard - Enfield NH, US
Gregory S. Wilson - Newbury NH, US
Jeffery L. Peterson - Lebanon NH, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K 10/00
US Classification:
21912139, 21912159, 21912148, 21912144
Abstract:
A thermal processing system includes a thermal torch for processing a workpiece, a power supply for providing power to the thermal torch, a positioning system for relatively moving the thermal torch and the workpiece, a controller for controlling the thermal processing system, and a deterministic-based communication network, such as, for example, a network which operates using SERCOS. The deterministic-based communications network connects at least the controller, the power supply, and the positioning system of the thermal processing system together.


Tate Picard Photo 5

Centralized Control Architecture For A Laser Materials Processing System

US Patent:
6947802, Sep 20, 2005
Filed:
Mar 31, 2003
Appl. No.:
10/403688
Inventors:
Tate S. Picard - Enfield NH, US
Kenneth J. Woods - Lebanon NH, US
William J. Connally - Grantham NH, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
G06F019/00
US Classification:
700117, 700170, 21912139
Abstract:
Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.


Tate Picard Photo 6

Centralized Control Architecture For A Plasma Arc System

US Patent:
6900408, May 31, 2005
Filed:
Jun 23, 2004
Appl. No.:
10/874569
Inventors:
Tate S. Picard - Enfield NH, US
Roger E. Young - Canaan NH, US
Gregory S. Wilson - Newbury NH, US
Ronald M. Huppe - Windsor VT, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K009/00
US Classification:
21912155, 21912151, 21912159
Abstract:
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.


Tate Picard Photo 7

Optimization And Control Of Beam Quality For Material Processing

US Patent:
2013014, Jun 13, 2013
Filed:
Dec 13, 2011
Appl. No.:
13/324135
Inventors:
Kenneth J. Woods - Lyme NH, US
Sanjay Garg - Hanover NH, US
Tate S. Picard - Enfield NH, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K 26/00, B23K 26/38, B23K 26/14, B23K 26/20, B23K 26/073, B23K 26/03
US Classification:
21912164, 21912183, 21912173, 21912172, 21912163, 21912167
Abstract:
Systems and methods are provided for adjusting a laser beam applied to a workpiece in a processing operation. A laser processing system receives the laser beam that is associated with a beam quality property. The laser processing system adjusts the laser beam to change the beam quality property based on a characteristic of the workpiece, a characteristic of the processing operation, or a combination thereof. The adjusted laser beam can also be delivered to the workpiece.


Tate Picard Photo 8

Centralized Control Architecture For A Plasma Arc System

US Patent:
2006021, Oct 5, 2006
Filed:
Mar 8, 2006
Appl. No.:
11/370751
Inventors:
Tate Picard - Enfield NH, US
Roger Young - West Lebanon NH, US
Gregory Wilson - Newbury NH, US
Ronald Huppe - Windsor VT, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K 26/04
US Classification:
219121620
Abstract:
Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.


Tate Picard Photo 9

Centralized Control Architecture For A Plasma Arc System

US Patent:
2006010, May 25, 2006
Filed:
Dec 30, 2005
Appl. No.:
11/323006
Inventors:
Tate Picard - Enfield NH, US
Kenneth Woods - Lebanon NH, US
Roger Young - Canaan NH, US
William Connally - Grantham NH, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K 26/00
US Classification:
219121620, 219121830
Abstract:
Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.


Tate Picard Photo 10

Centralized Control Architecture For A Laser Materials Processing System

US Patent:
2005020, Sep 22, 2005
Filed:
May 13, 2005
Appl. No.:
11/129007
Inventors:
Tate Picard - Enfield NH, US
Kenneth Woods - Lebanon NH, US
Roger Young - Canaan NH, US
William Connally - Grantham NH, US
Assignee:
Hypertherm, Inc. - Hanover NH
International Classification:
B23K026/00, G06F019/00
US Classification:
219121600, 219121730, 700166000
Abstract:
Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.