DR. SUNG GOHN PARK, M.D.
Anesthesiologist Assistant at Grove Ave, Richmond, VA
License number
Virginia 0101030177
Category
Osteopathic Medicine
Type
Anesthesiology
Address
Address
2
2621 Grove Ave, Richmond, VA 23220
PO Box 740209, Atlanta, GA 30374
PO Box 740209, Atlanta, GA 30374
Phone
(804) 254-5100
Personal information
See more information about SUNG GOHN PARK at radaris.comName
Address
Phone
4241 Sauterne Ct, Chantilly, VA 20151
4025 Mcginnis Ferry Rd APT 623, Suwanee, GA 30024
419 Council Dr NE, Vienna, VA 22180
3825 Lavista Rd, Tucker, GA 30084
3581 River Heights Xing, Marietta, GA 30067
Professional information
Sung Gohn Park, Richmond VA
Specialties:
Anesthesiologist
Address:
2621 Grove Ave, Richmond, VA 23220
Education:
Korea University, College of Medicine - Doctor of Medicine
Women's & Children's Hospital of Buffalo - Residency - Pediatric Anesthesiology
Women's & Children's Hospital of Buffalo - Residency - Pediatric Anesthesiology
Board certifications:
American Board of Anesthesiology Certification in Anesthesiology
Dr. Sung G Park, Richmond VA - MD (Doctor of Medicine)
Specialties:
Anesthesiology
Address:
2621 Grove Ave, Richmond 23220
(804) 254-5100 (Phone)
(804) 254-5100 (Phone)
Certifications:
Anesthesiology, 1997
Awards:
Healthgrades Honor Roll
Languages:
English
Hospitals:
2621 Grove Ave, Richmond 23220
Retreat Doctors' Hospital
2621 Grove Ave, Richmond 23220
Retreat Doctors' Hospital
2621 Grove Ave, Richmond 23220
Education:
Medical School
Korea University / College of Medicine
St Joseph Hosp
Beth Israel Medical Center-Petrie Campus
Childrens Hospital Of Buffalo
Buffalo Childrens Hospital
Graduated: 1978
Korea University / College of Medicine
St Joseph Hosp
Beth Israel Medical Center-Petrie Campus
Childrens Hospital Of Buffalo
Buffalo Childrens Hospital
Graduated: 1978
Owner, Choice Cap
Position:
Owner at choice cap
Location:
Greater Atlanta Area
Industry:
Apparel & Fashion
Work:
choice cap
-
Owner
Flexible Printed Conductive Fabric And Method For Fabricating The Same
US Patent:
8003198, Aug 23, 2011
Filed:
Nov 14, 2007
Appl. No.:
11/997766
Inventors:
Sung Mee Park - Atlanta GA, US
Kwang Su Cho - Gyeonggi-do, KR
Kyung Hee Chung - Seoul, KR
Kwang Su Cho - Gyeonggi-do, KR
Kyung Hee Chung - Seoul, KR
Assignee:
Kolon Glotech, Inc. - Gyeonggi-do
International Classification:
B41M 5/00, B44C 1/17, G03G 7/00
US Classification:
4281951, 428201, 428213, 4282924, 4282974, 428412, 428413, 428421, 4284231, 428446, 428457, 428458, 428480, 428500, 442 59, 442181, 174254, 361751
Abstract:
A conductive fabric is provided. The conductive fabric comprises a base layer composed of a synthetic, regenerated or natural fiber, a conductive layer formed on the base layer to be capable of being freely formed by a pre-designed electric pattern, and an insulating layer formed on the conductive layer to protect the conductive layer from damage.
Electronic Fabric And Preparing Thereof
US Patent:
2010020, Aug 19, 2010
Filed:
Oct 16, 2008
Appl. No.:
12/738565
Inventors:
Sung Mee Park - Atlanta GA, US
Kwang Su Cho - Yongin-si, KR
Kyung Hee Chung - Seoul, KR
Kwang Su Cho - Yongin-si, KR
Kyung Hee Chung - Seoul, KR
International Classification:
H01B 5/00, B05D 5/12, B32B 3/00
US Classification:
1741261, 427 973, 428141
Abstract:
Disclosed herein is an electronic fabric and preparing thereof. The electronic fabric comprises a backing layer configured to have a circuit electrically floated and a surface layer configured to electrically connect to the circuit of the backing layer. The backing layer or the surface layer comprises a) a base layer composed of a synthetic, regenerated or natural fiber and b) a conductive layer formed on the base layer to be capable of being freely formed by a pre-designed electric pattern. The base layer and the conductive layer are successively formed to be symmetrically to the backing layer and the surface layer to each other. An insulating layer is formed on the backing layer or the surface layer, or a partial upper portion of the conductive layer, or in a region where the conductive layer is not formed.
Electroluminescent Fabric Embedding Illuminated Fabric Display
US Patent:
8384288, Feb 26, 2013
Filed:
Dec 12, 2008
Appl. No.:
12/747745
Inventors:
Sung Mee Park - Atlanta GA, US
Kwang Su Cho - Yongin-si, KR
Kyung Hee Chung - Seoul, KR
Kwang Su Cho - Yongin-si, KR
Kyung Hee Chung - Seoul, KR
Assignee:
Kolon Glotech, Inc. - Gwacheon
International Classification:
H01J 1/70, H05B 33/02
US Classification:
313609, 313498, 313509, 455 46
Abstract:
Disclosed herein is an electroluminescent fabric embedding an illuminated fabric display. The electroluminescent fabric according to the present invention comprises: a foundation layer composed of a synthetic, regenerated or natural fiber; a polymer layer stacked on the base layer; a first bus bar stacked on the polymer layer; a transparent electrode layer stacked on the first bus bar; a fluorescent layer stacked on the transparent electrode layer; a dielectric layer stacked on the fluorescent layer; an interface electrode layer stacked on the dielectric layer; and a second bus bar connected to the interface electrode layer.