Steven Ly
Pharmacy in San Jose, CA

License number
Utah 9830807-1702
Issued Date
Jun 13, 2016
Expiration Date
Jun 13, 2021
Category
Pharmacy
Type
Pharmacy Intern
Address
Address
San Jose, CA

Organization information

See more information about Steven Ly at bizstanding.com

Steven Ly

1435 Goldenlake Rd, San Jose, CA 95131

Industry:
Business Services at Non-Commercial Site

Professional information

Steven Ly Photo 1

Process And System For Heating Semiconductor Substrates In A Processing Chamber Containing A Susceptor

US Patent:
2003020, Nov 13, 2003
Filed:
May 7, 2002
Appl. No.:
10/141515
Inventors:
Young Lee - Sunnyvale CA, US
Ronald Wang - Salem OR, US
Steven Ly - San Jose CA, US
Daniel Devine - Los Gatos CA, US
Assignee:
Mattson Technology, Inc.
International Classification:
C23C016/00, C23F001/00
US Classification:
156/345520, 118/728000, 118/725000
Abstract:
A process and system for heating semiconductor substrates in a processing chamber on a susceptor as disclosed. In accordance with the present invention, the susceptor includes a support structure made from a material having a relatively low thermal conductivity for suspending the wafer over the susceptor. The support structure has a particular height that inhibits or prevents radial temperature gradients from forming in the wafer during high temperature processing. If needed, recesses can be formed in the susceptor for locating and positioning a support structure. The susceptor can include a wafer supporting surface defining a pocket that has a shape configured to conform to the shape of a wafer during a heat cycle.


Steven Ly Photo 2

Process And System For Heating Semiconductor Substrates In A Processing Chamber Containing A Susceptor

US Patent:
2006003, Feb 16, 2006
Filed:
Oct 18, 2005
Appl. No.:
11/253271
Inventors:
Young Lee - Sunnyvale CA, US
Ronald Wang - Salem OR, US
Steven Ly - San Jose CA, US
Daniel Devine - Los Gatos CA, US
International Classification:
H05B 6/02, C23C 16/00
US Classification:
219600000, 118725000
Abstract:
A process and system for heating semiconductor substrates in a processing chamber on a susceptor as disclosed. In accordance with the present invention, the susceptor includes a support structure made from a material having a relatively low thermal conductivity for suspending the wafer over the susceptor. The support structure has a particular height that inhibits or prevents radial temperature gradients from forming in the wafer during high temperature processing. If needed, recesses can be formed in the susceptor for locating and positioning a support structure. The susceptor can include a wafer supporting surface defining a pocket that has a shape configured to conform to the shape of a wafer during a heat cycle.