STEVEN AUSTIN HANSEN
Physical Therapy at Bell Rd, Phoenix, AZ

7180576, Feb 20, 2007

Jul 13, 2004

10/889216

Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/54, G03B 27/42, G03B 27/72, G03B 27/32, G06F 17/50

355 67, 355 53, 355 71, 355 77, 703 13, 430 30

A method for optimizing the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the lithographic apparatus including an illuminator configured to illuminate the mask pattern, the method including determining a plurality of illumination arrangements for a pupil plane of the illuminator, each of the plurality of illumination arrangements being determined to improve a respective lithographic performance response parameter when illuminating the mask pattern; and adjusting an intensity of a first illumination arrangement of the plurality of illumination arrangements relative to a second illumination arrangement of the plurality of illumination arrangements, the mask pattern to be illuminated with the first and second illumination arrangements. The mask pattern may be illuminated at least once for each of the first and second illumination arrangements or all at once with at least the first illumination arrangement and the second illumination arrangement.

7245356, Jul 17, 2007

Nov 17, 2005

11/280985

Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/54, G03B 27/42, G03B 27/72, G03B 37/32, G06F 17/50, G03C 5/00

355 67, 355 55, 355 71, 355 77, 430 30, 703 13

A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.

7256873, Aug 14, 2007

Jan 28, 2004

10/765218

Jozef Maria Finders - Veldhoven, NL
Donis George Flagello - Scottsdale AZ, US
Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/32, G03B 27/42, G03B 27/54

355 77, 355 53, 355 67

A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

7528934, May 5, 2009

Sep 28, 2005

11/236870

Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/52, G03B 27/42

355 55, 355 53

A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto the substrate at a plurality of positions spaced apart from a reference plane that substantially coincides with or is substantially parallel to a surface of the substrate.

7684013, Mar 23, 2010

May 18, 2006

11/436058

Steven George Hansen - Phoenix AZ, US
Donis George Flagello - Scottsdale AZ, US
Wolfgang Singer - Aalen, DE
Bernd Peter Geh - Scottsdale AZ, US
Vladan Blahnik - Aalen, DE

ASML Netherlands B.V. - Veldhoven
Carl Zeiss SMT AG - Oberkochen

G03B 27/54, G03B 27/72

355 67, 355 71

A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NAand an aperture system; a projection lens having a first numerical aperture NA; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAof the projection lens is smaller than the numerical aperture NAof the illumination unit.

2013004, Feb 21, 2013

Jul 16, 2012

13/550561

Heine Melle MULDER - Veldhoven, NL
Steven George Hansen - Phoenix AZ, US
Thijs Johan Henry Hollink - Eindhoven, NL

ASML Netherlands B.V. - Veldhoven

G03B 27/54, G03B 27/32

355 67, 355 77

A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.

2008015, Jul 3, 2008

May 2, 2007

11/797356

Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03B 27/42

355 53, 355 67, 355 77

A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.

7906270, Mar 15, 2011

Mar 23, 2005

11/086664

Theodore A Paxton - Chandler AZ, US
Todd J Davis - Tempe AZ, US
Todd D. Hiar - Gilbert AZ, US
Cassandra May Owen - Chandler AZ, US
Steven George Hansen - Phoenix AZ, US

ASML Netherlands B.V. - Veldhoven

G03F 7/20

430311, 430394

A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.

2008003, Feb 7, 2008

Oct 4, 2007

11/867533

Steven Hansen - Phoenix AZ, US
Donis Flagello - Scottsdale AZ, US
Michel Klaassen - Eindhoven, NL
Laurentius De Winter - Vessem, NL
Edwin Knols - Breda, NL

ASML Netherlands B.V. - Veldhoven

G03B 27/72

355071000

A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to a circular monopole with equivalent σ.

2005000, Jan 13, 2005

Apr 2, 2004

10/816190

Steven Hansen - Phoenix AZ, US
Donis Flagello - Scottsdale AZ, US
Michel Fransois Klaassen - Eindhoven, NL
Laurentius De Winter - Vessem, NL
Edwin Wilhelmus Knols - Eindhoven, NL

ASML NETHERLANDS B.V. - Veldhoven

G03B027/68

355071000, 355067000, 355053000

A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to a circular monopole with equivalent σ.