STEPHEN VERNON
Marriage and Family Therapists at Estudillo Ave, San Leandro, CA

6451176, Sep 17, 2002

Nov 3, 2000

09/705980

Stephen P. Vernon - Pleasanton CA
Scott C. Burkhart - Livermore CA

The Regents of the University of California - Oakland CA

C23C 1446

20419211, 20429804, 20429806

A method and apparatus for the interception and trapping of or reflection of charged particulate matter generated in ion beam sputter deposition. The apparatus involves an electrostatic particle trap which generates electrostatic fields in the vicinity of the substrate on which target material is being deposited. The electrostatic particle trap consists of an array of electrode surfaces, each maintained at an electrostatic potential, and with their surfaces parallel or perpendicular to the surface of the substrate. The method involves interception and trapping of or reflection of charged particles achieved by generating electrostatic fields in the vicinity of the substrate, and configuring the fields to force the charged particulate material away from the substrate. The electrostatic charged particle trap enables prevention of charged particles from being deposited on the substrate thereby enabling the deposition of extremely low defect density films, such as required for reflective masks of an extreme ultraviolet lithography (EUVL) system.

6150060, Nov 21, 2000

Jan 11, 1999

9/227847

Stephen P. Vernon - Pleasanton CA

The Regents of the University of California - Oakland CA

G03F 900

430 5

A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

5958605, Sep 28, 1999

Nov 10, 1997

8/969411

Claude Montcalm - Livermore CA
Daniel G. Stearns - Los Altos CA
Stephen P. Vernon - Pleasanton CA

Regents of the University of California - Oakland CA

B32B 1504

428627

A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

6010600, Jan 4, 2000

Feb 22, 1996

8/607054

Stephen P. Vernon - Pleasanton CA
Natale M. Ceglio - Livermore CA

The Regents of the University of California - Oakland CA

C23C 1400, C23C 1600

20419211

The invention is a method for the production of axially symmetric, graded and ungraded thickness thin film and multilayer coatings that avoids the use of apertures or masks to tailor the deposition profile. A motional averaging scheme permits the deposition of uniform thickness coatings independent of the substrate radius. Coating uniformity results from an exact cancellation of substrate radius dependent terms, which occurs when the substrate moves at constant velocity. If the substrate is allowed to accelerate over the source, arbitrary coating profiles can be generated through appropriate selection and control of the substrate center of mass equation of motion. The radial symmetry of the coating profile is an artifact produced by orbiting the substrate about its center of mass; other distributions are obtained by selecting another rotation axis. Consequently there is a direct mapping between the coating thickness and substrate equation of motion which can be used to tailor the coating profile without the use of masks and apertures.

2012025, Oct 4, 2012

Mar 19, 2012

13/423498

Richard E. Stewart - San Ramon CA, US
Stephen P. Vernon - Pleasanton CA, US
Paul T. Steele - Livermore CA, US
Mark E. Lowry - Castro Valley CA, US

Lawrence Livermore National Security, LLC - Livermore CA

G02B 26/00

359238

A high sensitivity transient grating ultrafast radiation to optical image converter is based on a fixed transmission grating adjacent to a semiconductor substrate. X-rays or optical radiation passing through the fixed transmission grating is thereby modulated and produces a small periodic variation of refractive index or transient grating in the semiconductor through carrier induced refractive index shifts. An optical or infrared probe beam tuned just below the semiconductor band gap is reflected off a high reflectivity mirror on the semiconductor so that it double passes therethrough and interacts with the radiation induced phase grating therein. A small portion of the optical beam is diffracted out of the probe beam by the radiation induced transient grating to become the converted signal that is imaged onto a detector.

6002553, Dec 14, 1999

Feb 28, 1994

8/202991

Daniel G. Stearns - Los Altos CA
Stephen P. Vernon - Pleasanton CA
Natale M. Ceglio - Livermore CA
Andrew M. Hawryluk - Modesto CA

The United States of America as represented by the United States
Department of Energy - Washington DC

G11B 539

360113

A magnetoresistive sensor element with a three-dimensional micro-architecture is capable of significantly improved sensitivity and highly localized measurement of magnetic fields. The sensor is formed of a multilayer film of alternately magnetic and nonmagnetic materials. The sensor is optimally operated in a current perpendicular to plane mode. The sensor is useful in magnetic read/write heads, for high density magnetic information storage and retrieval.

5698113, Dec 16, 1997

Feb 22, 1996

8/607055

Sherry L. Baker - Pleasanton CA
Stephen P. Vernon - Pleasanton CA
Daniel G. Stearns - Los Altos CA

The Regents of the University of California - Oakland CA

C23C 1458

216 72

Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO. sub. 2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

6867149, Mar 15, 2005

Sep 27, 2002

10/256324

Sasa Bajt - Livermore CA, US
Stephen P. Vernon - Pleasanton CA, US

EUV Limited Liability Corporation - Santa Clara CA

H01L021/31

438763, 438758, 427 78, 427124, 427585, 205149, 205157, 205176

The chemical composition of thin films is modulated during their growth. A computer code has been developed to design specific processes for producing a desired chemical composition for various deposition geometries. Good agreement between theoretical and experimental results was achieved.