SEWON KANG
Pharmacy in Ann Arbor, MI

License number
Michigan 4301059208
Expiration Date
Jan 31, 2011
Category
Pharmacy
Type
CS - 3
Address
Address
Ann Arbor, MI 48109

Personal information

See more information about SEWON KANG at radaris.com
Name
Address
Phone
Sewon K Kang, age 66
3680 Creekside Ct, Ann Arbor, MI 48105
(734) 761-3986
Sewon K Kang, age 66
3080 Cedarbrook Rd, Ann Arbor, MI 48105
(734) 761-3986

Professional information

See more information about SEWON KANG at trustoria.com
Sewon Kang Photo 1
Compositions And Methods For Use Against Acne-Induced Inflammation And Dermal Matrix-Degrading Enzymes

Compositions And Methods For Use Against Acne-Induced Inflammation And Dermal Matrix-Degrading Enzymes

US Patent:
7268148, Sep 11, 2007
Filed:
Jun 27, 2005
Appl. No.:
11/169072
Inventors:
John J. Voorhees - Ann Arbor MI, US
Gary J. Fisher - Ypsilanti MI, US
Sewon Kang - Ann Arbor MI, US
Assignee:
Regents of the University of Michigan - Ann Arbor MI
International Classification:
A61K 31/445, A61K 31/443, A61K 31/38
US Classification:
514311, 514312, 514314, 514443, 514437, 514454
Abstract:
Acne-affected skin has been found to be accompanied by the presence of matrix-degrading enzymes such as MMPs and neutrophil elastase, induction of neutrophils, and a reduction in procollagen biosynthesis. This invention treats scarring and inflammation accompanying acne by administering, topically or systemically, at least one of (i) an inhibitor of the matrix degrading enzymes and (ii) a cytokine inhibitor that alleviates inflammation and thus also alleviate neutrophil infiltration. Alleviating the matrix degradation and renormalizing procollagen biosynthesis allows for reduced inflammation and better natural repair of acne-affected skin. Inhibiting cytokines alleviates induction of MMPs in resident skin cells, and also alleviates inflammation with its concommitant induction of neutrophils from the blood stream bringing MMPs and elastase into the acne lesion. Dimishing the presence of matrix-degrading enzymes in the acne lesion reduces imperfect repair of the skin and thus decreases scarring in acne-affected skin.


Sewon Kang Photo 2
Compositions And Methods For Use Against Acne-Induced Inflammation And Dermal Matrix-Degrading Enzymes

Compositions And Methods For Use Against Acne-Induced Inflammation And Dermal Matrix-Degrading Enzymes

US Patent:
2008007, Mar 20, 2008
Filed:
Jul 26, 2007
Appl. No.:
11/881214
Inventors:
John Voorhees - Ann Arbor MI, US
Gary Fisher - Ypsilanti MI, US
Sewon Kang - Ann Arbor MI, US
International Classification:
A61K 31/327, A61K 31/65, A61P 17/10
US Classification:
514154000, 514714000
Abstract:
Acne-affected skin has been found to be accompanied by the presence of matrix-degrading enzymes such as MMPs and neutrophil elastase, induction of neutrophils, and a reduction in procollagen biosynthesis. This invention treats scarring and inflammation accompanying acne by administering, topically or systemically, at least one of (i) an inhibitor of the matrix degrading enzymes and (ii) a cytokine inhibitor that alleviates inflammation and thus also alleviate neutrophil infiltration. Alleviating the matrix degradation and renormalizing procollagen biosynthesis allows for reduced inflammation and better natural repair of acne-affected skin. Inhibiting cytokines alleviates induction of MMPs in resident skin cells, and also alleviates inflammation with its concommitant induction of neutrophils from the blood stream bringing MMPs and elastase into the acne lesion. Diminishing the presence of matrix-degrading enzymes in the acne lesion reduces imperfect repair of the skin and thus decreases scarring in acne-affected skin.


Sewon Kang Photo 3
Compositions And Methods For Use Against Acne-Induced Inflammation And Dermal Matrix-Degrading Enzymes

Compositions And Methods For Use Against Acne-Induced Inflammation And Dermal Matrix-Degrading Enzymes

US Patent:
2006000, Jan 12, 2006
Filed:
Jun 27, 2005
Appl. No.:
11/168017
Inventors:
John Voorhees - Ann Arbor MI, US
Sewon Kang - Ann Arbor MI, US
Gary Fisher - Ypsilanti MI, US
International Classification:
A61K 31/4439
US Classification:
514340000
Abstract:
Acne-affected skin has been found to be accompanied by the presence of matrix-degrading enzymes such as MMPs and neutrophil elastase, induction of neutrophils, and a reduction in procollagen biosynthesis. This invention treats scarring and inflammation accompanying acne by administering, topically or systemically, at least one of (i) an inhibitor of the matrix degrading enzymes and (ii) a cytokine inhibitor that alleviates inflammation and thus also alleviate neutrophil infiltration. Alleviating the matrix degradation and renormalizing procollagen biosynthesis allows for reduced inflammation and better natural repair of acne-affected skin. Inhibiting cytokines alleviates induction of MMPs in resident skin cells, and also alleviates inflammation with its concommitant induction of neutrophils from the blood stream bringing MMPs and elastase into the acne lesion. Dimishing the presence of matrix-degrading enzymes in the acne lesion reduces imperfect repair of the skin and thus decreases scarring in acne-affected skin.


Sewon Kang Photo 4
Compositions And Methods For Inhibiting Photoaging Of Skin

Compositions And Methods For Inhibiting Photoaging Of Skin

US Patent:
6365630, Apr 2, 2002
Filed:
Jul 13, 2000
Appl. No.:
09/615218
Inventors:
Gary J. Fisher - Ann Arbor MI
John J. Voorhees - Ann Arbor MI
Sewon Kang - Ann Arbor MI
Assignee:
Regents of the University of Michigan
International Classification:
A61K 3120
US Classification:
514559, 424 59, 514725
Abstract:
Compositions and methods are provided for ameliorating various effects of UVA and UVB radiation from the sun. The compositions including an ingredient that prevents photoaging from MED and subMED radiation, such as a retinoid, certain other compounds (such as N-acetylcysteine, 2-furildioxime, and vitamin C) and optionally other MMP inhibitors such as tetracyclines and/or compounds that inhibit the P-450-mediated metabolism of retinoids such as ketoconazole and other azole compounds. In the method, the composition is applied prior to exposure to the sun; depending upon the ingredients used in the composition, application should be from 7 to 48 hours prior to exposure. Compounds that prevent erythema (skin reddening, sunburn) do not necessarily protect against UV-mediated elevation of MMP levels and activity, and similarly compounds that prevent UV-mediated elevation of MMP levels and activity are not necessarily effective against UV-induced erythema.


Sewon Kang Photo 5
Methods And Compositions For Preventing And Treating Chronological Aging In Human Skin

Methods And Compositions For Preventing And Treating Chronological Aging In Human Skin

US Patent:
6630516, Oct 7, 2003
Filed:
Feb 24, 1998
Appl. No.:
09/028435
Inventors:
James Varani - Ann Arbor MI
Gary J. Fisher - Ann Arbor MI
John J. Voorhees - Ann Arbor MI
Sewon Kang - Ann Arbor MI
Assignee:
The Regents of the University of Michigan - Ann Arbor MI
International Classification:
A61K 3107
US Classification:
514725, 514167, 514576, 514629, 424 59, 424 60
Abstract:
The deleterious effects of the passage of time on human skin (i. e. , chronological aging of human skin) can be prevented and treated with the topical application of a retinoid, preferably retinol. We have found that some of the same pathways (namely the stress-activated pathways, SAPs) activated in photoaging of human skin (i. e. , sun-induced premature skin aging) are similarly elevated in the skin of elderly people. We have also found that other pathways (namely the mitogen-activated ERK pathway) is depressed in the same skin. Treatment of chronologically-aged skin with a non-retinoid MMP inhibitor and optionally a retinoid both inhibits degradation of dermal collagen and promotes procollagen synthesis. Biopsied sections from skin of elderly (80+ years old) show that a single treatment can increase epidermal thickness, improve the dermal collagen density, and promote the formation of rete pegs and dermal papillae (see FIG. ), and can decrease the amount of c-Jun and increase the amounts of Types I and III procollagen (see FIG. ).


Sewon Kang Photo 6
Use Of Natural Egfr Inhibitors To Prevent Side Effects Due To Retinoid Therapy, Soaps, And Other Stimuli That Activate The Epidermal Growth Factor Receptor

Use Of Natural Egfr Inhibitors To Prevent Side Effects Due To Retinoid Therapy, Soaps, And Other Stimuli That Activate The Epidermal Growth Factor Receptor

US Patent:
6638543, Oct 28, 2003
Filed:
Feb 27, 2002
Appl. No.:
10/085978
Inventors:
Sewon Kang - Ann Arbor MI
Gary J. Fisher - Ypsilanti MI
John J. Voorhees - Ann Arbor MI
Assignee:
Regents of the University of Michigan - Ann Arbor MI
International Classification:
A61K 3578
US Classification:
424757, 424 59, 424401, 514859
Abstract:
Many human conditions, often skin conditions, are treated topically or orally with a retinoid such as retinoic acid or acetretin, which treatment often has the side effect of dry, irritated, and/or peeling skin. The use of soaps, detergents, chemical irritants, and such can also cause these same side effects. These side effects can be reduced or eliminated by the topical administration of an inhibitor, especially a natural inhibitor, of the epidermal growth factor receptor (EGFR), administered concomitantly with the retinoid, separately from the retinoid (such as on an as needed basis), or both. Administration of the two together is facilitated by a composition suitable for topical application and comprising both the retinoid and a natural EGFR inhibitor. Preferred natural inhibitors are genistein and other isoflavones extracted from natural occurring substances, or simple derivatives of such substances.


Sewon Kang Photo 7
Methods For Identifying Treatments That Treat And/Or Prevent Uv Irradiation Induced Photoaging

Methods For Identifying Treatments That Treat And/Or Prevent Uv Irradiation Induced Photoaging

US Patent:
2009002, Jan 22, 2009
Filed:
Jul 16, 2008
Appl. No.:
12/218532
Inventors:
Gary J. Fisher - Ann Arbor MI, US
Yiru Xu - Ann Arbor MI, US
Sewon Kang - Ann Arbor MI, US
John J. Voorhees - Ann Arbor MI, US
International Classification:
C12Q 1/42, G01N 33/573, A61K 36/00, A61K 8/97, A61Q 17/04, A61Q 19/00, A61P 17/00
US Classification:
424 59, 435 21, 435 74, 424725
Abstract:
Methods are provided for ascertaining and measuring RPTP-κ activity in response to insults such as UV irradiation and with respect to administration of a treatment and/or composition. Attenuation of EGFR activity by RPTP-κ affects aspects of photoaging, including damage to the skin, suppression of the immune system, DNA damage, and connective tissue degradation. Intervention with respect to the effects of photoaging can include protection of RPTP-κ from oxidation. The methods can be used for discovery of anti-aging treatments, adjuncts, or other preventative treatments, such as sunscreens.


Sewon Kang Photo 8
Uva (> 360-400) And Uvb (300-325) Specific Sunscreens

Uva (> 360-400) And Uvb (300-325) Specific Sunscreens

US Patent:
2006026, Nov 30, 2006
Filed:
Aug 3, 2006
Appl. No.:
11/499300
Inventors:
Gary Fisher - Ypsilanti MI, US
John Voorhees - Ann Arbor MI, US
Sewon Kang - Ann Arbor MI, US
International Classification:
A61K 8/19
US Classification:
424059000
Abstract:
UVB radiation of about 300-310 nm wavelength and UVA radiation of about 380-390 nm wavelength, each of which exists in solar light, induces MMPs (matrix metalloproteinases) in human skin that degrade the collagen of the dermal matrix. This degradation contributes to photoaging of human skin, which can be prevented by blocking these wavelengths of solar radiation. In contrast, diseases that result in the overproduction of collagen can be treated by exposing the affected with to radiation having wavelengths in those regions, for these wavelengths not only induce MMPs but also inhibit collagen biosynthesis. For lighter skinned people so affected, the UVA wavelengths are preferred because of the reduced amount of erythema, whereas dark skinned people can be treated with the UVB radiation because they generally do not suffer from erythema.


Sewon Kang Photo 9
Uva (> 360-400) And Uvb (300-325) Specific Sunscreens

Uva (> 360-400) And Uvb (300-325) Specific Sunscreens

US Patent:
7147863, Dec 12, 2006
Filed:
Jul 6, 2001
Appl. No.:
09/900535
Inventors:
Gary J. Fisher - Ypsilanti MI, US
John J. Voorhees - Ann Arbor MI, US
Sewon Kang - Ann Arbor MI, US
Assignee:
Regents of the University of Michigan - Ann Arbor MI
International Classification:
A61K 7/00, A61K 7/42, A61K 31/07
US Classification:
424401, 424 59, 514725
Abstract:
UVB radiation of about 300-310 nm wavelength and UVA radiation of about 380-390 nm wavelength, each of which exists in solar light, induces MMPs (matrix metalloproteinases) in human skin that degrade the collagen of the dermal matrix. This degradation contributes to photoaging of human skin, which can be prevented by blocking these wavelengths of solar radiation. In contrast, diseases that result in the overproduction of collagen can be treated by exposing the affected with to radiation having wavelengths in those regions, for these wavelengths not only induce MMPs but also inhibit collagen biosynthesis. For lighter skinned people so affected, the UVA wavelengths are preferred because of the reduced amount of erythema, whereas dark skinned people can be treated with the UVB radiation because they generally do not suffer from erythema.


Sewon Kang Photo 10
Use Of Compositions For Treating Rosacea

Use Of Compositions For Treating Rosacea

US Patent:
7795302, Sep 14, 2010
Filed:
Nov 30, 2005
Appl. No.:
11/290109
Inventors:
Sewon Kang - Ann Arbor MI, US
John J. Voorhees - Ann Arbor MI, US
Gary J. Fisher - Ypsilanti MI, US
Assignee:
The Regents of the University of Michigan - Ann Arbor MI
International Classification:
A61K 31/35, A61K 31/19, A61K 31/12, A61K 31/497
US Classification:
514460, 514557, 514558, 514680, 5142521
Abstract:
Rosacea is treated with a composition comprising an antimicrobial and at least one of an anti-inflammatory and a non-retinoid inhibitor of at least one of NF-B, AP-1, MMPs, adhesion molecules, TLRs, and CD14. The composition may further comprise a retinoid.