Inventors:
Ryan C. Smith - Roseville MN
Tiezhong Ma - San Jose CA
Stephen A. Campbell - Shoreview MN
Wayne L. Gladfelter - Roseville MN
Assignee:
Regents of the University of Minnesota - Minneapolis MN
International Classification:
H01L 21469
US Classification:
438785, 438591, 257E21639
Abstract:
A process for forming a hafnium oxide-containing film on a substrate such as silicon that includes introducing an anhydrous hafnium nitrate-containing precursor into a reactor containing the substrate, and converting the precursor into the hafnium oxide-containing film on the substrate by chemical vapor deposition.