RUBEN ZADOYAN
Pilots at Umbria, Irvine, CA

License number
California A5310127
Issued Date
May 2016
Expiration Date
May 2018
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
58 Umbria, Irvine, CA 92618

Professional information

Ruben Zadoyan Photo 1

Method And Apparatus For Oscillator Start-Up Control For Mode-Locked Laser

US Patent:
6693927, Feb 17, 2004
Filed:
Sep 13, 2002
Appl. No.:
10/242828
Inventors:
Christopher Horvath - Irvine CA
Ruben Zadoyan - Irvine CA
Assignee:
IntraLase Corp. - Irvine CA
International Classification:
H01S 3091
US Classification:
372 18, 372 70, 372 75
Abstract:
The invention is directed to an apparatus and method for oscillator start-up control, and more particularly to an apparatus and method for overdriving a laser to obtain mode-lock operation. The oscillator with start-up control has a lasing medium mounted on a base. A laser pumping source is mounted on the base for inducing a laser beam from the lasing medium. A mode-lock detection device is mounted about the base. An overdrive circuit is coupled with the mode-lock detection and signal processing device for determining mode-lock status of the oscillator. The overdrive circuit overdrives the pump source when the oscillator is not in mode-lock status.


Ruben Zadoyan Photo 2

System And Method For Monitoring In-Situ Processing Of Specimens Using Coherent Anti-Stokes Raman Scattering (Cars) Microscopy

US Patent:
8441630, May 14, 2013
Filed:
May 11, 2010
Appl. No.:
12/778074
Inventors:
Tommaso Baldacchini - Irvine CA, US
Ruben Zadoyan - Irvine CA, US
Assignee:
Newport Corporation - Irvine CA
International Classification:
G01J 3/44
US Classification:
356301
Abstract:
System and method are disclosed for in-situ monitoring of a specimen while undergoing a defined process. The system includes a processing system adapted to perform the defined process on the specimen, and a coherent anti-Stokes Raman scattering (CARS) microscopy system adapted to in-situ monitor the specimen. In another aspect, the CARS microscopy system is adapted to in-situ monitor the specimen simultaneous with the defined process being performed on the specimen by the processing system. In still another aspect, the CARS microscopy system is adapted to perform a measurement of the specimen while the defined process being performed on the specimen is paused or temporarily halted.


Ruben Zadoyan Photo 3

Method And System For Determining The Position And Alignment Of A Surface Of An Object In Relation To A Laser Beam

US Patent:
2008006, Mar 13, 2008
Filed:
Aug 6, 2007
Appl. No.:
11/834586
Inventors:
Christopher Horvath - Irvine CA, US
Ruben Zadoyan - Irvine CA, US
Ferenc Raksi - Lake Forest CA, US
Zsolt Bor - San Clemente CA, US
Guy Holland - San Clemente CA, US
Tibor Juhasz - Irvine CA, US
Assignee:
INTERLASE CORPORATION - Santa Ana CA
International Classification:
G01B 11/02
US Classification:
356499000
Abstract:
The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.


Ruben Zadoyan Photo 4

Method And System For Determining The Position And Alignment Of A Surface Of An Object In Relation To A Laser Beam

US Patent:
2006011, Jun 1, 2006
Filed:
Nov 12, 2005
Appl. No.:
11/271089
Inventors:
Christopher Horvath - Irvine CA, US
Ruben Zadoyan - Irvine CA, US
Ferenc Raksi - Irvine CA, US
Zsolt Bor - San Clemente CA, US
Guy Holland - San Clemente CA, US
Tibor Juhasz - Irvine CA, US
International Classification:
G01B 9/02
US Classification:
356450000
Abstract:
The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.


Ruben Zadoyan Photo 5

Method And System For Determining The Alignment Of A Surface Of A Material In Relation To A Laser Beam

US Patent:
6992765, Jan 31, 2006
Filed:
Oct 11, 2002
Appl. No.:
10/269340
Inventors:
Christopher Horvath - Irvine CA, US
Ruben Zadoyan - Irvine CA, US
Ferenc Raksi - Irvine CA, US
Zsolt Bor - San Clemente CA, US
Guy Vern Holland - San Clemente CA, US
Tibor Juhasz - Irvine CA, US
Assignee:
Intralase Corp. - Irvine CA
International Classification:
G01B 11/00
US Classification:
356399, 356400, 356124
Abstract:
The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.


Ruben Zadoyan Photo 6

System And Method For Scanning A Pulsed Laser Beam

US Patent:
2013021, Aug 15, 2013
Filed:
Mar 11, 2013
Appl. No.:
13/792758
Inventors:
Ferenc Raksi - Irvine CA, US
Ruben Zadoyan - Irvine CA, US
Marcel Bouvier - Aliso Viejo CA, US
Guy V. Holland - San Clemente CA, US
Assignee:
AMO DEVELOPMENT, LLC. - Santa Ana CA
International Classification:
A61F 9/008
US Classification:
606 5
Abstract:
Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.


Ruben Zadoyan Photo 7

Spaster Pattern And Pulse Blanking

US Patent:
2009017, Jul 2, 2009
Filed:
Jan 2, 2008
Appl. No.:
11/968589
Inventors:
Ferenc Raksi - Irvine CA, US
Ruben Zadoyan - Irvine CA, US
Marcel Bouvier - Quebec, CA
Guy V. Holland - San Clemente CA, US
Assignee:
Advanced Medical Optics, Inc. - Santa Ana CA
International Classification:
A61F 9/008, A61B 18/20
US Classification:
606 11, 606 5
Abstract:
System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.


Ruben Zadoyan Photo 8

Method And System For Laser Amplification Using A Dual Crystal Pockels Cell

US Patent:
7522642, Apr 21, 2009
Filed:
Mar 29, 2006
Appl. No.:
11/392191
Inventors:
Ruben Zadoyan - Irvine CA, US
Michael Karavitis - Seal Beach CA, US
Assignee:
AMO Development LLC - Santa Ana CA
International Classification:
H01S 3/10, H01S 3/11, H01S 3/115, G02F 1/03
US Classification:
372 12, 372 10, 372 20, 372 9, 359257
Abstract:
A system for laser amplification includes a dual-crystal Pockels cell which is used to control emission of laser pulses from an ultra-fast laser. The Pockels cell is constructed to enable adjustment of the rotational orientation of one crystal relative to the other crystal. The rotational orientation of one or both crystals in the Pockels cell is adjusted to control sidebands in the laser pulse.


Ruben Zadoyan Photo 9

Apparatus And Method For Correction Of Aberrations In Laser System Optics

US Patent:
7584756, Sep 8, 2009
Filed:
Aug 17, 2004
Appl. No.:
10/919710
Inventors:
Ruben Zadoyan - Irvine CA, US
Guy Vern Holland - San Clemente CA, US
Zolt Bor - San Clemente CA, US
Marcel Bouvier - Alisoviejo CA, US
Assignee:
AMO Development, LLC - Santa Ana CA
International Classification:
A61B 19/00, A61B 18/20
US Classification:
128898, 606 4, 606 12
Abstract:
The present invention provides a method for minimizing fluence distribution of a laser over a predetermined pattern. In particular, the method is useful for minimizing fluence variance over a predetermined pattern for lasers used in ophthalmic surgery.


Ruben Zadoyan Photo 10

Method And System For Laser Amplification Using A Dual Crystal Pockels Cell

US Patent:
7830581, Nov 9, 2010
Filed:
Mar 31, 2009
Appl. No.:
12/414894
Inventors:
Ruben Zadoyan - Irvine CA, US
Michael Karavitis - Seal Beach CA, US
Assignee:
AMO Development, LLC - Santa Ana CA
International Classification:
G02F 1/03, H01S 3/10, H01S 3/11, H01S 3/115
US Classification:
359257, 372 9, 372 10, 372 12, 372 20
Abstract:
A system for laser amplification includes a dual-crystal Pockels cell which is used to control emission of laser pulses from an ultra-fast laser. The Pockels cell is constructed to enable adjustment of the rotational orientation of one crystal relative to the other crystal. The rotational orientation of one or both crystals in the Pockels cell is adjusted to control sidebands in the laser pulse.