RONALD L SPANGLER
Pilots at Pne St, Arlington, MA

6650666, Nov 18, 2003

Dec 21, 2001

10/027210

Ronald L. Spangler - Arlington MA
Robert N. Jacques - Andover MA
John A. Rule - Hingham MA
Frederick A. Palenschat - Lemon Grove CA
Igor V. Fomenkov - San Diego CA
John M. Algots - San Diego CA
Jacob P. Lipcon - Winchester MA
Richard L. Sandstrom - Encinitas CA

Cymer, Inc. - San Diego CA

H01S 310

372 20, 372 57

An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide (1) fast feedback control based on wavelength measurements, (2) fast vibration control, (3) active damping using the load cell and an active damping module, (4) transient inversion using feed forward algorithms based on historical burst data.

6704339, Mar 9, 2004

Aug 30, 2002

10/233253

Leonard Lublin - Concord MA
David J. Warkentin - Boston MA
Palash P. Das - Vista CA
Brian C. Klene - La Jolla CA
R. Kyle Webb - Escondido CA
Herve A. Besaucele - San Diego CA
Ronald L. Spangler - Arlington MA
Richard L. Sandstrom - Encinitas CA
Alexander I. Ershov - San Diego CA
Shahryar Rokni - Carlsbad CA

Cymer, Inc. - San Diego CA

H01S 3101

372 57, 372 58

The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

6757316, Jun 29, 2004

May 11, 2001

09/854097

Peter C. Newman - San Diego CA
Thomas P. Duffey - San Diego CA
William N. Partlo - Poway CA
Richard L. Sandstrom - Encinitas CA
Paul C. Melcher - El Cajon CA
David M. Johns - Lakeside CA
Robert B. Saethre - San Diego CA
Vladimir B. Fleurov - Escondido CA
Richard M. Ness - San Diego CA
Curtis L. Rettig - Vista CA
Robert A. Shannon - Ramona CA
Richard C. Ujazdowski - San Diego CA
Shahryar Rokni - Carlsbad CA
Xiaojiang J. Pan - San Diego CA
Vladimir Kulgeyko - San Diego CA
Scott T. Smith - San Diego CA
Stuart L. Anderson - San Diego CA
John M. Algots - San Diego CA
Ronald L. Spangler - Arlington MA
Igor V. Fomenkov - San Diego CA

Cymer, Inc. - San Diego CA

H01S 322

372 57, 372 25, 372 3802, 372 3804, 372 3807, 372 58, 372 59

The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0. 25 milliseconds between pulses.

7382815, Jun 3, 2008

Aug 9, 2004

10/915517

Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - La Jolla CA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US

Cymer, Inc. - San Diego CA

H01S 5/00

372 55, 372 57

An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.

7298770, Nov 20, 2007

Aug 5, 2004

10/912933

Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - La Jolla CA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US

Cymer, Inc. - San Diego CA

H01S 3/22, H01S 3/223, H01S 3/10, H01S 3/13

372 55, 372 9, 372 20, 372 23, 372 24, 372 25, 372 32, 372 57

An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.

6853653, Feb 8, 2005

Dec 21, 2001

10/036925

Ronald L. Spangler - Arlington MA, US
Jacob P. Lipcon - Winchester MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - Andover MA, US
Armen Kroyan - San Diego CA, US
Ivan Lalovic - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
John M. Algots - San Diego CA, US

Cymer, Inc. - San Diego CA

H01J003/10

372 20, 372 25, 372 30, 372 32

An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2. 0 millisecond.

2002009, Jul 25, 2002

Oct 1, 2001

09/968180

Ronald Spangler - Arlington MA, US
Robert Jacques - Andover MA, US
Kenneth Lazarus - Concord MA, US

G05B013/00, G01M001/38, G05B015/00, G05B021/00, G05D023/00

700/280000, 700/056000, 700/060000

A motion control system is provided which optimizes the desired motion of a structure being controlled by the system. The system may be used in conjunction with existing structural control systems, or replace such structural control systems entirely. Optimization of a desired motion occurs by applying a mathematical controller to a theoretical desired motion, the controller optimizing the desired motion by taking into account one or more state parameters.

6882674, Apr 19, 2005

Dec 21, 2001

10/036676

Christian J. Wittak - San Diego CA, US
William N. Partlo - Poway CA, US
Richard L. Sandstrom - Encinitas CA, US
Paul C. Melcher - El Cajon CA, US
David M. Johns - Lakeside CA, US
Robert B. Saethre - San Diego CA, US
Richard M. Ness - San Diego CA, US
Curtis L. Rettig - Vista CA, US
Robert A. Shannon - Ramona CA, US
Richard C. Ujazdowski - San Diego CA, US
Shahryar Rokni - Carlsbad CA, US
Scott T. Smith - San Diego CA, US
Stuart L. Anderson - San Diego CA, US
John M. Algots - San Diego CA, US
Ronald L. Spangler - Arlington MA, US
Igor V. Fomenkov - San Diego CA, US
Thomas D. Steiger - San Diego CA, US
Jerome A. Emilo - San Diego CA, US
Clay C. Titus - San Diego CA, US
Alex P. Ivaschenko - La Jolla CA, US
Paolo Zambon - San Diego CA, US
Gamaralalage G. Padmabandu - San Diego CA, US
Mark S. Branham - Fallbrook CA, US
Sunjay Phatak - Alpine CA, US
Raymond F. Cybulski - San Diego CA, US

Cymer, Inc. - San Diego CA

H01S003/22

372 58, 372 55, 372 57, 372 59

The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0. 25 milliseconds between pulses.

2005020, Sep 15, 2005

Jan 4, 2005

11/028686

Ronald Spangler - Arlington MA, US
Emanuele Bianchini - Winchester MA, US
Baruch Pletner - Newton MA, US
Betsy Marsh - Melrose MA, US
Robert Jacques - San Diego CA, US

H01L041/08

310338000

A vibration control system comprising an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The actuator may comprise one or more plates or elements of electro-active material bonded to an electroded sheet.

6959484, Nov 1, 2005

Jan 27, 2000

09/491969

Ronald Spangler - Arlington MA, US
Emanuele Bianchini - Charlestown MA, US
Baruch Pletner - Newton MA, US
Betsy Marsh - Brookline MA, US
Robert Jacques - Andover MA, US

Cymer, Inc. - San Diego CA

B23P021/00, H01L041/08

29709, 29720, 29721, 29729, 29740, 29744, 29 2535, 310328, 310330, 310366

A vibration control system comprising an actuator, and a sensor useful for controlling vibrations in systems for fabricating electronics equipment. The actuator may comprise one or more plates or elements of electro-active material bonded to an electroded sheet.