MR. ROBERT MICHAEL MILLER, PHYSICIAN ASSISTANT
Physician Assistant at Hospital Pkwy, San Jose, CA
License number
California PA17118
Category
Nursing
Type
Physician Assistant
Address
Address
275 Hospital Pkwy, San Jose, CA 95119
Phone
(408) 972-6065
Personal information
See more information about ROBERT MICHAEL MILLER at radaris.comName
Address
Phone
5040 Comanche Dr APT 1, La Mesa, CA 91942
5032 Carriage Ln, Santa Rosa, CA 95403
501 W Sierra Ave APT 246, Fresno, CA 93704
5026 Gaviota Ave, Encino, CA 91436
507 Morro Dr, Santa Maria, CA 93454
Professional information
Hydroxycarborane Photoresists And Process For Using Same In Bilayer Thin Film Imaging Lithography
US Patent:
6482566, Nov 19, 2002
Filed:
Feb 18, 2000
Appl. No.:
09/507522
Inventors:
Donald C. Hofer - Paso Robles CA
Scott A. MacDonald - San Jose CA
Arpan P. Mahorowala - White Plains NY
Robert D. Miller - San Jose CA
Josef Michl - Boulder CO
Gregory M. Wallraff - Morgan Hill CA
Scott A. MacDonald - San Jose CA
Arpan P. Mahorowala - White Plains NY
Robert D. Miller - San Jose CA
Josef Michl - Boulder CO
Gregory M. Wallraff - Morgan Hill CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03C 173
US Classification:
4302701, 430322, 430323, 430326, 430905, 430910, 430914
Abstract:
A photoresist composition which includes hydroxycarborane either incorporated as a monomeric dissolution modifier or as pendent groups on a polymer backbone. The photoresist composition is particularly useful in a bilayer thin film imaging lithographic process in which ultraviolet radiation-imaging in a wavelength range of between about 365 nm and about 13 nm is employed.
O-Quinone Diazide Sulfonic Acid Monoesters Useful As Sensitizers For Positive Resists
US Patent:
4853315, Aug 1, 1989
Filed:
Jan 15, 1988
Appl. No.:
7/144825
Inventors:
Dennis R. McKean - San Jose CA
Robert D. Miller - San Jose CA
Joseph G. Walsh - Oakland CA
Carlton G. Willson - San Jose CA
Robert D. Miller - San Jose CA
Joseph G. Walsh - Oakland CA
Carlton G. Willson - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03C 154, G03C 160, C07C11300
US Classification:
430192
Abstract:
Esters of 1-oxo-2-diazo-naphthalene sulfonic acid wherein the sulfonic acid group is at either the 4 or the 5 position of a hydroxymethyl-tricyclo [5. 2. 1. sup. 2,6 ] decane wherein the hydroxy group is either at the 3 or 4 position and useful as sensitizers for positive resists, particularly relatively thick resists at 365 nm.
High Contrast, High Resolution Deep Ultraviolet Lithographic Resist Composition With Diazo Carbonyl Compound Having Alpha Phosphoryl Substitution
US Patent:
4601969, Jul 22, 1986
Filed:
Mar 28, 1985
Appl. No.:
6/717254
Inventors:
Nicholas J. Clecak - San Jose CA
Barbara D. Grant - Ossining NY
Robert D. Miller - San Jose CA
Terry C. Tompkins - Los Altos CA
Carlton G. Willson - San Jose CA
Barbara D. Grant - Ossining NY
Robert D. Miller - San Jose CA
Terry C. Tompkins - Los Altos CA
Carlton G. Willson - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03C 154
US Classification:
430192
Abstract:
A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
Reworkable Thermoplastic Encapsulant
US Patent:
6111323, Aug 29, 2000
Filed:
Dec 30, 1997
Appl. No.:
9/000754
Inventors:
Kenneth Raymond Carter - San Jose CA
Craig Jon Hawker - Los Gatos CA
James Lupton Hedrick - Pleasanton CA
Robert Dennis Miller - San Jose CA
Michael Anthony Gaynes - Vestal NY
Stephen Leslie Buchwalter - Hopewell Junction NY
Craig Jon Hawker - Los Gatos CA
James Lupton Hedrick - Pleasanton CA
Robert Dennis Miller - San Jose CA
Michael Anthony Gaynes - Vestal NY
Stephen Leslie Buchwalter - Hopewell Junction NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 2328
US Classification:
257787
Abstract:
The invention is an encapsulated circuit assembly including a chip; a substrate; at least one solder joint which spans between the chip and the substrate forming an electrically conductive connection between the chip and the substrate; and an encapsulant formed adjacent the solder joint, wherein the encapsulant comprises a thermoplastic polymer formed by ring opening polymerization of a cyclic oligomer.
Memory Card For Use With Portable Electronic Devices
US Patent:
D447481, Sep 4, 2001
Filed:
Aug 19, 1999
Appl. No.:
D/109632
Inventors:
Robert F. Wallace - Suunyvale CA
Robert C. Miller - San Jose CA
Robert C. Miller - San Jose CA
Assignee:
SanDisk Corporation - Sunnyvale CA
International Classification:
1402
US Classification:
D14436
Object Position Detector
US Patent:
5648642, Jul 15, 1997
Filed:
Oct 25, 1994
Appl. No.:
8/329809
Inventors:
Robert J. Miller - San Jose CA
Stephen J. Bisset - Los Altos CA
Stephen J. Bisset - Los Altos CA
Assignee:
Synaptics, Incorporated - San Jose CA
International Classification:
G08C 2100
US Classification:
178 18
Abstract:
A proximity sensor system includes a sensor matrix array having a characteristic capacitance between horizontal and vertical conductors connected to sensor pads. The capacitance changes as a function of the proximity of an object or objects to the sensor matrix. The change in capacitance of each node in both the X and Y directions of the matrix due to the approach of an object is converted to a set of voltages in the X and Y directions. These voltages are processed by analog circuitry to develop electrical signals representative of the centroid of the profile of the object, i. e, its position in the X and Y dimensions. The profile of position may also be integrated to provide Z-axis (pressure) information.
Memory Card With Two Sets Of Contacts
US Patent:
D515587, Feb 21, 2006
Filed:
Mar 28, 2005
Appl. No.:
29/226478
Inventors:
Edwin J. Cuellar - San Jose CA, US
Eliyahou Harari - Saratoga CA, US
Robert C. Miller - San Jose CA, US
Hem P. Takiar - Fremont CA, US
Robert F. Wallace - Sunnyvale CA, US
Eliyahou Harari - Saratoga CA, US
Robert C. Miller - San Jose CA, US
Hem P. Takiar - Fremont CA, US
Robert F. Wallace - Sunnyvale CA, US
Assignee:
SanDisk Corporation - Sunnyvale CA
International Classification:
1402
US Classification:
D14436
Deep Ultra-Violet Lithographic Resists With Diazohomotetramic Acid Compounds
US Patent:
4522911, Jun 11, 1985
Filed:
Jun 28, 1983
Appl. No.:
6/508642
Inventors:
Nicholas J. Clecak - San Jose CA
Dennis R. McKean - San Jose CA
Robert D. Miller - San Jose CA
Terry C. Tompkins - Los Altos CA
Carlton G. Willson - San Jose CA
Dennis R. McKean - San Jose CA
Robert D. Miller - San Jose CA
Terry C. Tompkins - Los Altos CA
Carlton G. Willson - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03C 154, G03C 160, C07C11300
US Classification:
430192
Abstract:
A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
Preparation Of Iodonium And Sulfonium Triflates
US Patent:
4786441, Nov 22, 1988
Filed:
Aug 24, 1987
Appl. No.:
7/088779
Inventors:
Robert D. Miller - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C07C14302
US Classification:
260513F
Abstract:
An iodonium or sulfonium triflate is prepared by dissolving or slurring a iodonium or sulfonium halide in an organic solvent and reacting it with a trimethylsilyl triflate.
Apparatus For Photorefractive Two Beam Coupling
US Patent:
5361148, Nov 1, 1994
Filed:
Jan 21, 1993
Appl. No.:
8/006450
Inventors:
Gary C. Bjorklund - Los Altos CA
Donald M. Burland - San Jose CA
Marcus C. J. M. Donckers - ES Leiden, NL
Robert D. Miller - San Jose CA
William E. Moerner - San Jose CA
Scott M. Silence - Fremont CA
Robert J. Twieg - San Jose CA
Cecilia A. Walsh - San Jose CA
Donald M. Burland - San Jose CA
Marcus C. J. M. Donckers - ES Leiden, NL
Robert D. Miller - San Jose CA
William E. Moerner - San Jose CA
Scott M. Silence - Fremont CA
Robert J. Twieg - San Jose CA
Cecilia A. Walsh - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03H 102
US Classification:
359 4
Abstract:
The present invention relates to an improved process for producing photorefractive net gain two beam coupling utilizing polymeric materials.