Inventors:
Robert Foster - San Francisco CA
David N. Wang - Cupertino CA
Sasson Somekh - Redwood City CA
Dan Maydan - Los Altos Hills CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1400
Abstract:
A plasma CVD reactor and associated process use magnetic field enhancement to provide high quality, very high deposition rate metal, dielectric and conformal semiconductor films. The reacter and process are designed for automated, high-throughout, in-line small dimension VLSI integrated circuit fabrication, and are applicable to multistep in-situ processing.