Inventors:
Donald Franklin Foust - Glenville NY, US
Hongbo Cao - Cohoes NY, US
Laura Anne Clark - Brighton CO, US
Robert Andrew Garber - Denver CO, US
Wyatt Keith Metzger - Louisville CO, US
Yinghui Shan - Cohoes NY, US
Roman Shuba - Albany CA, US
Assignee:
GENERAL ELECTRIC COMPANY - SHENECTADY NY
International Classification:
H01L 31/18
Abstract:
Methods for treating a semiconductor layer including a semiconductor material are presented. A method includes contacting at least a portion of the semiconductor material with a passivating agent. The method further includes forming a first region in the semiconductor layer by introducing a dopant into the semiconductor material; and forming a chalcogen-rich region. The method further includes forming a second region in the semiconductor layer, the second region including a dopant, wherein an average atomic concentration of the dopant in the second region is greater than an average atomic concentration of the dopant in the first region. Photovoltaic devices are also presented.