ROBERT B MYERS
Architects in New York, NY

License number

Pennsylvania RA004458B

Personal information

See more information about ROBERT B MYERS at radaris.com

Name

Address

Phone

Robert Myers

500 Mumper Ln, Dillsburg, PA 17019

Robert Myers

5009 E Prospect Rd, York, PA 17406

(717) 799-5389

Robert Myers, age 54

4 River St, Lindenhurst, NY 11757

Robert Myers, age 63

4 Locust Ln, Airville, PA 17302

(717) 574-9288

Robert Myers, age 70

49 Basil Rd, Langhorne, PA 19047

(215) 527-0733

Professional information

See more information about ROBERT B MYERS at trustoria.com

Director, Principal It Network Architect At Starwood Hotels &Amp; Resorts Worldwide, Inc.

Position:

Director, Principal IT Network Architect at Starwood Hotels & Resorts Worldwide, Inc.

Location:

Greater New York City Area

Industry:

Financial Services

Work:

Starwood Hotels & Resorts Worldwide, Inc. - White Plains, New York since Jul 2011 - Director, Principal IT Network Architect Thomson Reuters May 2009 - Jul 2011 - Network Engineer Broadridge May 2008 - Nov 2008 - Senior Network Engineer Thomson Financial Dec 2006 - May 2008 - Group Leader - Implementation Engineering Thomson Reuters (formerly Thomson Financial) Oct 2000 - Dec 2006 - Implementation Engineer Thomson Reuters (formerly ILX Systems) Oct 1998 - Oct 2000 - Installation Engineer Thomson Reuters (formerly ILX Systems) Nov 1995 - Oct 1998 - Client Service Representative

Education:

State University of New York College at Buffalo 1987 - 1992
BS, Management Copiague High School
cisco academy

Skills:

BGP, Frame Relay, RIP, HSRP, NAT, Solarwinds, DS3, IGRP, TFTP, MPLS, Switches, Routers, Firewalls, FTP, Checkpoint, Visio, NTP, ACL, Routing, Cisco, VPN, TCP/IP, CCNA, OSPF, WAN, DNS, Data Center, Network Engineering, Network Architecture, Network Design, VLAN, Multicast, Network Security, QoS, IP Networking, STP, PIX, IPSec, Troubleshooting, Disaster Recovery, Cisco IOS, Cisco Technologies, EIGRP

Database Administrator At S&Amp;P Capital Iq

Position:

Database Administrator at S&P Capital IQ

Location:

Greater New York City Area

Industry:

Information Technology and Services

Work:

S&P Capital IQ - New York, NY since Jul 2012 - Database Administrator EDIMS, LLC - Parsippany, NJ Jul 2010 - Jul 2012 - Database Administrator CareOne Management LLC Nov 2009 - Aug 2010 - Database Administrator Robert Half Technology Dec 2008 - Apr 2010 - Database Administrator TransitCenter, Inc. Apr 2007 - Oct 2008 - Database Administrator DialAmerica Marketing, Inc. Apr 2000 - Apr 2007 - Database Analyst IBM Global Services 1999 - 2000 - Data Analyst

Education:

Fairleigh Dickinson University 2002 - 2004

Skills:

Data Warehousing, SQL Server, SSIS, Database Design, Databases, Configuration, Performance Tuning, Microsoft SQL Server, Configurations

Time Correction System For Multi-Nozzle Ink Jet Printer

US Patent:

4158204, Jun 12, 1979

Filed:

Apr 24, 1978

Appl. No.:

5/899136

Inventors:

Lawrence Kuhn - Ossining NY
Robert A. Myers - New York NY
Roy L. Russo - Yorktown Heights NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01D 1800

US Classification:

346 75

Abstract:

In an ink jet nozzle per spot printer, the transit time of each stream is measured on a periodic basis. In response to the measured transit times, the time at which information imparting signals are applied to the respective charge electrodes is controlled. The transit time is measured (counted) in units of a drop cycle. The slowest count is detected, and the difference is taken between the transit time of the slowest stream and all other streams. In the instance when there is a transit time difference of zero between the slowest stream and a given stream, the printing signal is provided to the charge electrode without delay. In the instances when a transit time difference is detected, an information imparting signal is applied to the charge electrode with a delay dependent upon the sensed transit time difference. A data register has information signals stored therein which are indicative of the data to be printed. Such data will be printed during an appropriate portion of a data cycle.

Network Engineer At Thomson

Position:

Network Engineer at Thomson

Location:

Greater New York City Area

Industry:

Financial Services

Work:

Thomson - Network Engineer

Education:

State University of New York College at Buffalo 1987 - 1992

Creative Director At Water Power Technology Corp

Position:

Creative Director at water Power Technology Corp

Location:

Greater New York City Area

Industry:

Mechanical or Industrial Engineering

Work:

water Power Technology Corp - Creative Director

Robert Charles Myers, New York NY - Lawyer

Address:

Clifford Chance Us LLP
31 W 52Nd St, New York 10019
(212) 259-8000

Licenses:

New York - Currently registered 1970

Education:

Columbia University School of Law

Specialties:

Mergers / Acquisitions - 34%
Criminal Defense - 33%
Litigation - 33%

Student Assisstant At City University Of New York (Cuny

Position:

Student Assistant at City University of New York (CUNY

Location:

Greater New York City Area

Industry:

Program Development

Work:

City University of New York (CUNY since Aug 2009 - Student Assistant RuffaloCODY Oct 2010 - Mar 2011 - Telefund Caller Prep for Prep Jun 2008 - Aug 2009 - Prep 9 Advisor

Education:

Carnegie Mellon University 2008 - 2009

Spm Base Focal Plane Positioning

US Patent:

6369397, Apr 9, 2002

Filed:

Jan 4, 1999

Appl. No.:

09/225120

Inventors:

Brent A. Anderson - Jericho VT
James A. Bruce - Williston VT
Steven J. Holmes - Milton VT
Peter H. Mitchell - Jericho VT
Robert A. Myers - New York NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01N 1310

US Classification:

2504922, 250306, 250307, 2504911

Abstract:

A method and apparatus for positioning a wafer in an electron beam lithography system. This method includes the steps of positioning a scanned probe microscope in the lithography system, and determining the distance between a preset location on the scanned probe microscope and a reference position in the lithography system. The wafer is brought into physical contact with that preset location, and then the wafer is moved a predetermined distance from the preset location on order to position the wafer at the desired focal plane in the lithography system.