Inventors:
William E. Hoke - Wayland MA
Richard Traczewski - Milton MA
Peter J. Lemonias - Watertown MA
Assignee:
Raytheon Company - Lexington MA
International Classification:
H01L 21365, H01L 3100
Abstract:
A method for growing a Group II-VI epitaxial layer on a substrate, said epitaxial layer having an electron mobility greater than 1. 5. times. 10. sup. 5 cm. sup. 2 /V-sec at 77. degree. K. and a carrier concentration less than 4. times. 10. sup. 15 (cm. sup. -3) is described. The method includes the steps of directing a plurality of vapor flows towards the substrate including a Group II metalorganic vapor having a mole fraction in the range of 3. times. 10. sup. -4 to 4. 5. times. 10. sup. -4, a Group VI metalorganic vapor having a mole fraction in the range of 2. 9. times. 10. sup. -3 to 3. 5. times. 10. sup. -3 and a Group II elemental metal vapor having a mole fraction in the range of 2. 6. times. 10. sup. -2 to 3. 2. times. 10. sup. -2. The source of Group II metal is heated to at least 240. degree. C. while radiant energy is directed toward the reactor vessel to warm the zone of the reactor vessel between the Group II metal source and the substrate to at least 240. degree. C.