MR. RICHARD PAUL TOMASCO, RN
Nursing at Highway 20, Corvallis, OR
License number
Oregon 201242226RN
Category
Nursing
Type
Registered Nurse
Address
Address
4455 Highway 20 NE, Corvallis, OR 97330
Phone
(541) 758-5900
Professional information
Mems Device And Method Of Forming Mems Device
US Patent:
7079301, Jul 18, 2006
Filed:
Mar 28, 2005
Appl. No.:
11/092410
Inventors:
Michael G. Monroe - Corvallis OR, US
Eric L. Nikkel - Philomath OR, US
Michele K. Szepesi - Salem OR, US
Stephen J. Potochnik - Corvallis OR, US
Richard P. Tomasco - Corvallis OR, US
Eric L. Nikkel - Philomath OR, US
Michele K. Szepesi - Salem OR, US
Stephen J. Potochnik - Corvallis OR, US
Richard P. Tomasco - Corvallis OR, US
Assignee:
Hewlett-Packard Development Company, L.P. - Houston TX
International Classification:
G02B 26/00
US Classification:
359290, 359223, 359295
Abstract:
A method of forming a MEMS device includes providing a substructure including a base material and at least one conductive layer formed on a side of the base material, forming a dielectric layer over the at least one conductive layer of the substructure, defining an actuating area for the MEMS device on the dielectric layer, including depositing a conductive material on the dielectric layer and communicating the conductive material with the at least one conductive layer of the substructure through the dielectric layer, forming a sacrificial layer over the conductive material and the dielectric layer, including depositing silicon over the conductive material and the dielectric layer, and forming a substantially planar surface of the silicon, forming an actuating element over the sacrificial layer within the actuating area, including communicating the actuating element with the conductive material of the actuating area through the sacrificial layer, and substantially removing the sacrificial layer between the actuating element and the dielectric layer.
Mems Device And Method Of Forming Mems Device
US Patent:
2005007, Apr 7, 2005
Filed:
Oct 2, 2003
Appl. No.:
10/677825
Inventors:
Michael Monroe - Corvallis OR, US
Eric Nikkel - Philomath OR, US
Michele Szepesi - Salem OR, US
Stephen Potochnik - Corvallis OR, US
Richard Tomasco - Corvallis OR, US
Eric Nikkel - Philomath OR, US
Michele Szepesi - Salem OR, US
Stephen Potochnik - Corvallis OR, US
Richard Tomasco - Corvallis OR, US
International Classification:
G02B026/00
US Classification:
359290000
Abstract:
A method of forming a MEMS device includes providing a substructure including a base material and at least one conductive layer formed on a side of the base material, forming a dielectric layer over the at least one conductive layer of the substructure, defining an actuating area for the MEMS device on the dielectric layer, including depositing a conductive material on the dielectric layer and communicating the conductive material with the at least one conductive layer of the substructure through the dielectric layer, forming a sacrificial layer over the conductive material and the dielectric layer, including depositing silicon over the conductive material and the dielectric layer, and forming a substantially planar surface of the silicon, forming an actuating element over the sacrificial layer within the actuating area, including communicating the actuating element with the conductive material of the actuating area through the sacrificial layer, and substantially removing the sacrificial layer between the actuating element and the dielectric layer.
Richard Tomasco
Location:
Corvallis, Oregon Area
Industry:
Semiconductors