Ping Liu
Massage Therapy in Denver, CO

License number
Colorado 15335
Issued Date
Aug 19, 2013
Renew Date
Feb 1, 2015
Expiration Date
Dec 31, 2016
Type
Massage Therapist
Address
Address
PO Box 71, Denver, CO 80040

Professional information

Ping Liu Photo 1

Buried Anode Lithium Thin Film Battery And Process For Forming The Same

US Patent:
6805999, Oct 19, 2004
Filed:
Mar 17, 2003
Appl. No.:
10/110581
Inventors:
Se-Hee Lee - Lakewood CO
C. Edwin Tracy - Golden CO
Ping Liu - Denver CO
Assignee:
Midwest Research Institute - Kansas City MO
International Classification:
H01M 440
US Classification:
429162, 4292311, 4292312, 42923195, 429322, 296231, 296235, 205 59
Abstract:
A reverse configuration, lithium thin film battery ( ) having a buried lithium anode layer ( ) and process for making the same. The present invention is formed from a precursor composite structure ( ) made by depositing electrolyte layer ( ) onto substrate ( ), followed by sequential depositions of cathode layer ( ) and current collector ( ) on the electrolyte layer. The precursor is subjected to an activation step, wherein a buried lithium anode layer ( ) is formed via electroplating a lithium anode layer at the interface of substrate ( ) and electrolyte film ( ). The electroplating is accomplished by applying a current between anode current collector ( ) and cathode current collector ( ).


Ping Liu Photo 2

Pd/Ni-Wo3 Anodic Double Layer Gasochromic Device

US Patent:
6723566, Apr 20, 2004
Filed:
Jan 29, 2003
Appl. No.:
10/240020
Inventors:
Se-Hee Lee - Lakewood CO
C. Edwin Tracy - Golden CO
J. Roland Pitts - Lakewood CO
Ping Liu - Denver CO
Assignee:
Midwest Research Institute - Kansas City MO
International Classification:
G01N 2178
US Classification:
436144, 436167, 422 86, 422 91
Abstract:
An anodic double layer gasochromic sensor structure for optical detection of hydrogen in improved response time and with improved optical absorption real time constants, comprising: a glass substrate; a tungsten-doped nickel oxide layer coated on the glass substrate; and a palladium layer coated on the tungsten-doped nickel oxide layer.


Ping Liu Photo 3

Plasma Enhanced Chemical Vapor Deposition (Pecvd) Method Of Forming Vanadium Oxide Films And Vanadium Oxide Thin-Films Prepared Thereby

US Patent:
6156395, Dec 5, 2000
Filed:
Jun 3, 1999
Appl. No.:
9/325146
Inventors:
Ji-Guang Zhang - Golden CO
C. Edwin Tracy - Golden CO
David K. Benson - Golden CO
John A. Turner - Littleton CO
Ping Liu - Lakewood CO
Assignee:
Midwest Research Institute - Kansas City MO
International Classification:
C23C 1640
US Classification:
427576
Abstract:
A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.


Ping Liu Photo 4

Plasma Enhanced Chemical Vapor Deposition Vanadium Oxide Thin Films

US Patent:
2003002, Jan 30, 2003
Filed:
Oct 4, 2002
Appl. No.:
10/180861
Inventors:
Ji-Guang Zhang - Marietta GA, US
C. Tracy - Golden CO, US
David Benson - Golden CO, US
John Turner - Littleton CO, US
Ping Liu - Lakewood CO, US
International Classification:
H01M004/48, C01G031/02
US Classification:
429/231500, 423/592000
Abstract:
Thin-film vanadium oxide layer that is suitable for use as a cathode in a lithium ion battery or other electronic applications, such as ion insertion layers in electrochromic devices as well as other uses, is deposited by a plasma-enhanced chemical vapor deposition at room temperature at rates as high as 11 /sec. from a vanadium-containing precursor reacted with oxygen and hydrogen. The vanadium oxide-based cathode produced by a lower temperature process and at a high deposition rate, exhibits a high discharge capacity, a high energy density, and a negligible capacity fade fiom its second cycle to at least 2,900 cycles, thus providing enhanced cyclic stability and an improved component for rechargeable lithium-ion batteries and other electronic devices.


Ping Liu Photo 5

Ho Doped Wo, Ultra-Fast, High-Sensitivity Hydrogen Sensors

US Patent:
7910373, Mar 22, 2011
Filed:
May 5, 2001
Appl. No.:
10/240082
Inventors:
Ping Liu - Denver CO, US
C. Edwin Tracy - Golden CO, US
J. Roland Pitts - Lakewood CO, US
Se-Hee Lee - Lakewood CO, US
Assignee:
Alliance for Sustainable Energy, LLC - Golden CO
International Classification:
G01N 21/78
US Classification:
436144, 422 86, 42725519, 436154, 436166
Abstract:
An ultra-fast response, high sensitivity structure for optical detection of low concentrations of hydrogen gas, comprising: a substrate; a water-doped WOlayer coated on the substrate; and a palladium layer coated on the water-doped WOlayer.


Ping Liu Photo 6

Thin Film Buried Anode Battery

US Patent:
7632602, Dec 15, 2009
Filed:
Jul 29, 2004
Appl. No.:
10/901863
Inventors:
Se-Hee Lee - Lakewood CO, US
C. Edwin Tracy - Golden CO, US
Ping Liu - Denver CO, US
Assignee:
Alliance For Sustainable Energy, LLC - Golden CO
International Classification:
H01M 10/04, H01M 10/38, H01M 4/40, H01M 4/48, H01M 4/66
US Classification:
429162, 4292311, 4292312, 42923195, 429245, 296235
Abstract:
A reverse configuration, lithium thin film battery () having a buried lithium anode layer () and process for making the same. The present invention is formed from a precursor composite structure () made by depositing electrolyte layer () onto substrate (), followed by sequential depositions of cathode layer () and current collector () on the electrolyte layer. The precursor is subjected to an activation step, wherein a buried lithium anode layer () is formed via electroplating a lithium anode layer at the interface of substrate () and electrolyte film (). The electroplating is accomplished by applying a current between anode current collector () and cathode current collector ().