Inventors:
Anthony Zampini - Westborough MA
Peter Trefonas - Medway MA
Pamela Turci - Harvard MA
Catherine C. Meister - Medway MA
Gerald C. Vizvary - Lowell MA
Assignee:
Shipley Company, L.L.C. - Marlboro MA
International Classification:
G03F 7023
Abstract:
The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.