Nils Deneke Hoivik
Engineers in Boulder, CO
License number
Colorado 56745
Issued Date
Jun 18, 1999
Renew Date
Jun 18, 1999
Type
Engineer Intern
Address
Address
2718 Moorehead Ave APT 206, Boulder, CO 80303
Professional information
Atomic Layer Deposition On Micro-Mechanical Devices
US Patent:
7426067, Sep 16, 2008
Filed:
Dec 17, 2002
Appl. No.:
10/322195
Inventors:
Victor M. Bright - Boulder CO, US
Jeffrey Elam - Boulder CO, US
Francois Fabreguette - Boulder CO, US
Steven M. George - Boulder CO, US
Nils Hoivik - Boulder CO, US
Yung-Cheng Lee - Boulder CO, US
Ryan Linderman - Boulder CO, US
Marie Tripp - Boulder CO, US
Jeffrey Elam - Boulder CO, US
Francois Fabreguette - Boulder CO, US
Steven M. George - Boulder CO, US
Nils Hoivik - Boulder CO, US
Yung-Cheng Lee - Boulder CO, US
Ryan Linderman - Boulder CO, US
Marie Tripp - Boulder CO, US
Assignee:
Regents of the University of Colorado - Boulder CO
International Classification:
G02B 26/08
US Classification:
359223, 359900
Abstract:
A micro-electromechanical device or MEMS having a conformal layer of material deposited by atomic layer deposition is discussed. The layer may provide physical protection to moving components of the device, may insulate electrical components of the device, may present a biocompatible surface interface to a biological system, and may otherwise improve such devices. The layer may also comprise a combination of multiple materials each deposited with great control to allow creating layers of customizable properties and to allow creating layers having multiple independent functions, such as providing physical protection from wear and providing electrical insulation.