NIKOLAY EFREMOW
Broker in Melrose, MA
License number
Massachusetts 109399
Issued Date
May 1, 1979
Expiration Date
Sep 1, 2017
Type
Broker
Address
Address
Melrose, MA 02176
Professional information
Dry Etching Patterning Of Electrical And Optical Materials
US Patent:
4734152, Mar 29, 1988
Filed:
Jul 13, 1987
Appl. No.:
7/073905
Inventors:
Michael W. Geis - Acton MA
Nikolay N. Efremow - Melrose MA
Stella W. Pang - Arlington MA
Nikolay N. Efremow - Melrose MA
Stella W. Pang - Arlington MA
Assignee:
Massachusetts Institute of Technology - Cambridge MA
International Classification:
H01L 21306, C23F 102, B44C 122, C03C 1500
US Classification:
156646
Abstract:
A new anisotropic dry etching system using a hot jet tube to heat and dissociate non-reactive source gas to form a directed flux of reactive specie or radicals for etching materials through openings in a resist or a reusable stencil of SiN. sub. x wherein x is in the range of 1. 5 to 0. 5. Si and GaAs may be etched using Cl. sub. 2, F. sub. 3, Br. sub. 2 or SF. sub. 6 source gasses. Pb or Hg, Cd, Te may be etched using n-butane, dimethyl ether or acetone as a source gas for CH. sub. 3 radicals. The tube may be formed of tungsten or where fluorine is used as a source gas, an irridium tube is preferred. Alternatively, a tube formed of rhenium or an alloy of rhenium and tungsten is preferred for some applications.