NIKLAS DELLBY
Pilots at 201 Pl, Seattle, WA

License number
Washington A5024029
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
5131 NE 201St Pl, Seattle, WA 98155

Professional information

Niklas Dellby Photo 1

Chief Scientist At Nion Co

Position:
chief scientist at Nion co
Location:
Greater Seattle Area
Industry:
Nanotechnology
Work:
Nion co - chief scientist
Education:
Massachusetts Institute of Technology 1990 - 1995
PhD, Physics
Stanford University 1984 - 1985
ms, physics
The Institute of Technology at Linköping University 1982 - 1984


Niklas Dellby Photo 2

Aberration-Corrected Charged-Particle Optical Apparatus

US Patent:
6770887, Aug 3, 2004
Filed:
Jul 8, 2002
Appl. No.:
10/189855
Inventors:
Ondrej L. Krivanek - Sammamish WA 98029
Peter D. Nellist - Kirkland WA 98034
Niklas Dellby - Lake Forest Park WA 98155
International Classification:
G21R 510
US Classification:
250396R, 250396 ML, 2504921, 2504922, 25049222, 25049223, 250310, 250311
Abstract:
Aberration-corrected charged-particle optical apparatus improving the resolution of charged-particle optical systems by eliminating or minimizing optical aberrations. The apparatus comprises a source of charged particles and a plurality of charged-particle lenses including non-round lenses, energized in such manner so as to correct axial aberrations of orders up to and including fifth order. The non-round lenses comprise quadrupoles and octupoles disposed in such manner that fifth order combination aberrations are precisely controlled in addition to third order aberrations. The resultant apparatus very significantly improves on resolution attainable with non-aberration corrected charged-particle round lenses. It also improves on resolution attainable with correctors of third order aberrations only.


Niklas Dellby Photo 3

Autoadjusting Charged-Particle Probe-Forming Apparatus

US Patent:
6552340, Apr 22, 2003
Filed:
Oct 12, 2000
Appl. No.:
09/686805
Inventors:
Ondrej L. Krivanek - Sammamish WA
Niklas Dellby - Lake Forest Park WA
Andrew R. Lupini - Hemel Hempstead, GB
Assignee:
Nion Co. - Kirkland WA
International Classification:
H01J 3721
US Classification:
250310, 250307, 250305, 356401, 356372, 356399
Abstract:
An autoadjusting charged-particle probe-forming apparatus improving the resolution of probe-forming charged-particle optical systems by minimizing optical aberrations. The apparatus comprises a source of charged particles, a probe-forming system of charged-particle lenses, a plurality of detectors optionally comprising a two-dimensional image detector, power supplies, a computer and appropriate software. Images are recorded by the two-dimensional detector and analyzed to determine the aberration characteristics of the apparatus. Alternately, multiple scanned images are recorded by a scanned image detector and also analyzed to determine the aberration characteristics of the apparatus. The aberration characteristics are used to automatically adjust the apparatus for improved optical performance.


Niklas Dellby Photo 4

High Resolution Energy-Selecting Electron Beam Apparatus

US Patent:
8373137, Feb 12, 2013
Filed:
Sep 24, 2010
Appl. No.:
12/924320
Inventors:
Ondrej L. Krivanek - Sammamish WA, US
Niklas Dellby - Lake Forest Park WA, US
Assignee:
Nion Co. - Kirkland WA
International Classification:
H01J 3/26
US Classification:
250396R, 250396 ML
Abstract:
A high resolution energy-selecting electron beam apparatus and method for improving the energy resolution of electron-optical systems by restricting the energy range of admitted electrons, and optionally also for improving the spatial resolution by correcting chromatic and geometric aberrations. The apparatus comprises a plurality of magnetic or electrostatic prisms that disperse an electron beam according to the energies of the electrons into an energy spectrum, a plurality of magnifying lenses such as electromagnetic or electrostatic quadrupoles that increase the energy dispersion of the energy spectrum, an energy-selecting slit that selects a desirable range of energies of the electrons, and optionally also sextupole, octupole and higher-order lenses that correct chromatic and geometric aberration of the electron-optical system. The apparatus also comprises further magnetic or electrostatic prisms and electron lenses arranged such that the energy dispersion of the electron beam emerging from the apparatus is cancelled.