NATHAN JOSEPH KRUSE
Pilots in Colorado Springs, CO
License number
Colorado A5182414
Issued Date
May 2014
Expiration Date
May 2019
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
PO Box 2304, Colorado Springs, CO 80841
Professional information
Bi-Layer Etch Stop Process For Defect Reduction And Via Stress Migration Improvement
US Patent:
7423344, Sep 9, 2008
Filed:
Feb 26, 2007
Appl. No.:
11/678967
Inventors:
Tae S. Kim - Dallas TX, US
Jin Zhao - Plano TX, US
Nathan J. Kruse - Colorado Springs CO, US
August J. Fischer - Dallas TX, US
Ralf B. Willecke - Dallas TX, US
Jin Zhao - Plano TX, US
Nathan J. Kruse - Colorado Springs CO, US
August J. Fischer - Dallas TX, US
Ralf B. Willecke - Dallas TX, US
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01L 23/48
US Classification:
257754, 257755, 257756
Abstract:
A method of forming a film stack in an integrated circuit, said method comprising depositing a layer of silicon carbide adjacent a first layer of dielectric material, depositing a layer of silicon nitride adjacent the layer of silicon carbide, and depositing a second layer of dielectric material adjacent the layer of silicon nitride.