Minh Q Le
Esthetician at Pne Hvn Dr, Colorado Springs, CO
License number
Colorado 620680
Issued Date
Oct 29, 2013
Renew Date
Apr 1, 2016
Expiration Date
Mar 31, 2018
Type
Esthetician
Address
Address
5150 Pine Haven Dr, Colorado Springs, CO 80923
Professional information
Monitor Of Plasma Processes With Multivariate Statistical Analysis Of Plasma Emission Spectra
US Patent:
6153115, Nov 28, 2000
Filed:
Oct 23, 1997
Appl. No.:
8/956575
Inventors:
Minh Le - Colorado Springs CO
Kuang Han Chen - Boston MA
Taber H. Smith - Dallas TX
Duane S. Boning - Belmont MA
Herbert H. Sawin - Chestnut Hill MA
Kuang Han Chen - Boston MA
Taber H. Smith - Dallas TX
Duane S. Boning - Belmont MA
Herbert H. Sawin - Chestnut Hill MA
Assignee:
Massachusetts Institute of Technology - Cambridge MA
International Classification:
G01J 3457
US Classification:
216 60
Abstract:
Plasma process analysis techniques are provided. The intensity of each of a number, P, of a plurality of radiation wavelengths that are emitted from a plasma process are monitored as the process proceeds. Indications of P-dimensional correlations between the intensities of the P monitored wavelengths are produced as the process proceeds. Then the produced correlation indications are compared with a prespecified correlation indication generated based on historical conditions for the plasma process, to determine the status condition of the process as the process proceeds. With this technique, the use of a priori, expected, specific templates is not required for evaluating radiation emission data during a plasma process. Instead the techniques investigate and discover the multiple complex correlations that form between various radiation emission wavelengths during a plasma process, and do not impose an expectation for a specific correlation or trend between the various wavelengths. The discovered correlations found to exist between the radiation wavelengths are then employed for monitoring a plasma process based on the discovered correlations.