MICHAEL WADE O'BRIEN, M.D.
Student, Health Care at New Scotland Ave, Albany, NY
License number
New York 63919
Category
Student, Health Care
Type
Student in an Organized Health Care Education/Training Program
Address
Address
47 New Scotland Ave, Albany, NY 12208
Phone
(518) 262-6679
Personal information
See more information about MICHAEL WADE O'BRIEN at radaris.comName
Address
Phone
4693 W Line Rd, Amsterdam, NY 12010
472 7Th St APT 3L, Brooklyn, NY 11215
469 15Th St, West Babylon, NY 11704
465 W End Ave #B, New York, NY 10024
464 Pawling Ave, Troy, NY 12180
Professional information
Videographer At University At Albany
Position:
Videographer at University at Albany
Location:
Albany, New York Area
Industry:
Higher Education
Work:
University at Albany
-
Videographer
Attorney At Nys Department Of Health
Position:
Attorney at NYS Department of Health
Location:
Albany, New York Area
Industry:
Health, Wellness and Fitness
Work:
NYS Department of Health
-
Attorney
Michael O'brien - Loudonville, NY
Work:
The Goo Media Group - Manhattan, NY
Intern Town of Colonie West Albany Pocket Park - Albany, NY
Laborer WRCM- Manhattan College Radio
Co-host- R&A Sports Radio WTEN-ABC- News Channel - Manhattan, NY
Marketing/Public Relations (Intern) WTEN-ABC- News Channel - Albany, NY
Assignment/News desk (Intern) Capital Region High School
VOLUNTEER Regional Food Bank & Community Garden Colonie Youth Center - Colonie, NY
Basketball Referee & Football Camp Counselor Colonie Babe Ruth
Intern Town of Colonie West Albany Pocket Park - Albany, NY
Laborer WRCM- Manhattan College Radio
Co-host- R&A Sports Radio WTEN-ABC- News Channel - Manhattan, NY
Marketing/Public Relations (Intern) WTEN-ABC- News Channel - Albany, NY
Assignment/News desk (Intern) Capital Region High School
VOLUNTEER Regional Food Bank & Community Garden Colonie Youth Center - Colonie, NY
Basketball Referee & Football Camp Counselor Colonie Babe Ruth
Education:
Manhattan College, School of Arts - Riverdale, NY
Bachelor of Arts in Communication
Bachelor of Arts in Communication
Airlines/Aviation Professional
Location:
Albany, New York Area
Industry:
Airlines/Aviation
Michael O'Brien, Loudonville NY - Teacher
Specialties:
Chemistry
Work:
Siena College - Loudonville NY
Technical Assistant At Hudson Valley Community College
Position:
Technical Assistant at Hudson Valley Community College
Location:
Albany, New York Area
Industry:
Higher Education
Work:
Hudson Valley Community College
-
Technical Assistant
A&Amp;P At Colgan Airlines
Position:
A&P at Colgan Airlines
Location:
Albany, New York Area
Industry:
Airlines/Aviation
Work:
Colgan Airlines
-
A&P
Method For Making Tertiary Butyl Esters
US Patent:
4921999, May 1, 1990
Filed:
Aug 23, 1988
Appl. No.:
7/235088
Inventors:
Michael J. O'Brien - Albany NY
Assignee:
General Electric Company - Schenectady NY
International Classification:
C07C 6976, C07J 0000
US Classification:
560 52
Abstract:
A method is provided for making tertiary butyl esters by effecting reaction between an organic carboxylic acid and isobutylene in the presence of an effective amount of trifluoromethane sulfonic acid at temperatures below about -7. degree. C. Tertiary butyl esters are useful as dissolution inhibitors for novolak resins.
Resist Compositions Comprising A Phenolic Resin, An Acid Forming Onium Salt And A Tert-Butyl Ester Or Tert-Butyl Carbonate Which Is Acid-Cleavable
US Patent:
5310619, May 10, 1994
Filed:
May 13, 1992
Appl. No.:
7/889261
Inventors:
James V. Crivello - Clifton Park NY
Michael J. O'Brien - Albany NY
Julia L. Lee - Schenectady NY
Michael J. O'Brien - Albany NY
Julia L. Lee - Schenectady NY
Assignee:
MicroSi, Inc. - Phoenix AZ
International Classification:
G03F 7004, G03F 740
US Classification:
430270
Abstract:
A positive photoresist composition is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
Method For Making A Patterned Resist Substrate Composite
US Patent:
5362607, Nov 8, 1994
Filed:
Feb 14, 1994
Appl. No.:
8/195275
Inventors:
James V. Crivello - Clifton Park NY
Michael J. O'Brien - Albany NY
Julia L. Lee - Schenectady NY
Michael J. O'Brien - Albany NY
Julia L. Lee - Schenectady NY
Assignee:
MicroSi, Inc. - Phoenix AZ
International Classification:
G03F 730, G03F 738, G03F 740
US Classification:
430326
Abstract:
A method for preparing a positive photoresist substrate composite is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.