MICHAEL SCOTT SMITH
Pilots at Spruce Mdw Dr, Albuquerque, NM
License number
New Mexico A5126310
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
1212 Spruce Meadows Dr NE, Albuquerque, NM 87144
Personal information
See more information about MICHAEL SCOTT SMITH at radaris.comName
Address
Phone
407 Camino De La Sierra NE, Albuquerque, NM 87123
Professional information
Michael G. Smith, Albuquerque NM - Lawyer
Office:
Keleher & McLeod, P.A.
201 3Rd St NW SUITE 1200, Albuquerque, NM 87102
201 3Rd St NW SUITE 1200, Albuquerque, NM 87102
Specialties:
Civil Litigation, Commercial Litigation
ISLN:
922016127
Admitted:
2009, New Mexico, 2011, Federal District Court, District of New Mexico Bar
University:
University of New Mexico, Bachelors in Political Science, magna cum laude, 2006
Law School:
University of New Mexico School of Law, J.D., 2009
Links:
Site
Biography:
Mr. Smith represents clients in a variety of civil and commercial litigation. <br /><br />Professional Affiliations: <br /><br />State Bar of New Mexico, American Bar Association. <br /><br />Awards &...
Open2Love
Position:
Clerk at La Montanita co-op
Location:
Albuquerque, New Mexico Area
Industry:
Alternative Medicine
Work:
La Montanita co-op
since Oct 2009
-
Clerk
Gallup Solar
2009 - 2011
-
Board member
Education:
Valley 2002 - 2004
Michael Scott Smith
Position:
Associate at Keleher & McLeod, P.A., Felony attorney at New Mexico public defenders
Location:
Albuquerque, New Mexico Area
Industry:
Law Practice
Work:
Keleher & McLeod, P.A.
since Oct 2011
-
Associate
New Mexico public defenders
- Albuquerque since 2009
-
Felony attorney
Education:
The University of New Mexico School of Law 2006 - 2009
Michael Smith - Rio Rancho, NM
Work:
IBM Corporation
Siebel & OBIEE Administrator BMC Strategy Computers Technical Training Institute - Bellevue, WA IBM Corporation - Seattle, WA
Tier II Client Support Administrator Microsoft - Issaquah, WA
Software Test Engineer II Micro Learning Center - Lakewood, WA
Siebel & OBIEE Administrator BMC Strategy Computers Technical Training Institute - Bellevue, WA IBM Corporation - Seattle, WA
Tier II Client Support Administrator Microsoft - Issaquah, WA
Software Test Engineer II Micro Learning Center - Lakewood, WA
Method And Apparatus For Monitoring Plasma Processing Operations
US Patent:
6077386, Jun 20, 2000
Filed:
Apr 23, 1998
Appl. No.:
9/065680
Inventors:
Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
C23F 102
US Classification:
156345
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.
Method And Apparatus For Monitoring Plasma Processing Operations
US Patent:
6123983, Sep 26, 2000
Filed:
Apr 23, 1998
Appl. No.:
9/065257
Inventors:
Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
G01J 330, G06F 1900, C23C 1400
US Classification:
427 10
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.
Method And Apparatus For Monitoring Plasma Processing Operations
US Patent:
6157447, Dec 5, 2000
Filed:
Apr 23, 1998
Appl. No.:
9/065359
Inventors:
Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
G01J 330
US Classification:
356316
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.
Method And Apparatus For Monitoring Plasma Processing Operations
US Patent:
6192826, Feb 27, 2001
Filed:
Apr 23, 1998
Appl. No.:
9/065203
Inventors:
Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
C23C 1600
US Classification:
118723AN
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.
Method And Apparatus For Monitoring Plasma Processing Operations
US Patent:
6134005, Oct 17, 2000
Filed:
Apr 23, 1998
Appl. No.:
9/064793
Inventors:
Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
G01B 902
US Classification:
356346
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.
Method And Apparatus For Monitoring Plasma Processing Operations
US Patent:
6221679, Apr 24, 2001
Filed:
Apr 23, 1998
Appl. No.:
9/064957
Inventors:
Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM
Assignee:
Sandia Corporation - Albuquerque NM
International Classification:
G01J 3443
US Classification:
438 7
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.