MICHAEL PARKER
Social Work at Kearney St, Fremont, CA

License number
California C28021214
Category
Social Work
Type
Addiction (Substance Use Disorder)
Address
Address
3155 Kearney St, Fremont, CA 94538
Phone
(510) 573-4026

Professional information

Michael Parker Photo 1

Process For Minimizing Electrostatic Damage And Pole Tip Recession Of Magnetoresistive Magnetic Recording Head During Pole Tip Trimming By Focused Ion Beam Milling

US Patent:
6521902, Feb 18, 2003
Filed:
Aug 15, 2000
Appl. No.:
09/638507
Inventors:
Thomas Young Chang - Menlo Park CA
Michael Andrew Parker - Fremont CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01J 3708
US Classification:
25049221, 2504923, 20429836, 2960313
Abstract:
The improved method for trimming a magnetic head utilizing a FIB tool includes a step of aligning the FIB tool milling boxes without imaging critical pole tip components and structure. The method includes the creation of an alignment box that is disposed in a known, fixed orientation relative to the FIB tool milling boxes. The FIB tool is aligned by imaging only the alignment box and by moving the alignment box relative to known pole tip structural characteristics that are disposed away from the critical pole tip components. The alignment box is visually aligned on non-sensitive pole tip components in such a manner that the milling boxes will be properly aligned relative to the sensitive pole tip components. FIB tool milling is thereafter performed within the milling boxes which have been accurately aligned without imaging of sensitive pole tip components.


Michael Parker Photo 2

Method And Apparatus For Compensating Waveforms, Spectra, And Profiles Derived Therefrom For Effects Of Drift

US Patent:
7002143, Feb 21, 2006
Filed:
Feb 15, 2002
Appl. No.:
10/077036
Inventors:
Michael Andrew Parker - Fremont CA, US
Daryl J. Pocker - San Jose CA, US
Assignee:
Internaional BusinessMachines Corporation - Armonk NY
International Classification:
H01J 49/00
US Classification:
250282, 702 22, 702 30
Abstract:
A method and apparatus for compensating waveforms, spectra, and profiles derived therefrom for effects of drift is disclosed. The present invention removes the effects of drift from a sequential series of waveforms obtained from a waveform-source device, or spectra, from a spectrometer, to produce for output a sequential series of drift-compensated waveforms, or spectra, respectively. In addition, the present invention performs a factor analysis, or alternatively a linear-least-squares analysis, on an array of the drift-compensated waveforms, or spectra to provide a set of drift-compensated principal factors; and, generates drift-compensated scaled target-factor profiles from a profile trajectory lying within a space of the set of drift-compensated principal factors. In addition, in the case of spectra, the invention provides for conversion of the drift-compensated scaled target-factor profiles to drift-compensated compositional profiles. The invention finds particular utility in the field of electron spectroscopy when the invention is applied to correcting sputter-depth-profile analyzes for the effects of spectral drift caused by charging in insulating samples.


Michael Parker Photo 3

High-Resolution, Patterned-Media Master Mask

US Patent:
7842437, Nov 30, 2010
Filed:
Dec 31, 2007
Appl. No.:
12/006433
Inventors:
James G. Belleson - Hillsborough CA, US
Michael A. Parker - Fremont CA, US
Robert O. Schwenker - San Jose CA, US
Assignee:
Hitachi Global Storage Technologies, Netherlands, B.V. - Amsterdam
International Classification:
G03F 9/00
US Classification:
430 5, 430296, 430942, 25049222, 2504923
Abstract:
A high-resolution, patterned-media master mask is disclosed. The high-resolution, patterned-media master mask includes an electron-absorption substrate for absorbing electrons from an electron beam (e-beam) during an e-beam exposure by an e-beam lithography process and suppressing a backscattering of the electrons based on an electron-backscattering-suppressing atomic number associated with a constituent atomic species of the electron-absorption substrate, wherein the electron-absorption substrate comprises a material composed of greater than fifty atomic percent of the constituent atomic species, and wherein the electron backscattering-suppressing atomic number is less than an atomic number eight. The high-resolution, patterned-media master mask further includes a patterned portion coupled with the electron-absorption substrate, wherein the patterned portion is patterned by the e-beam lithography process, and wherein a resolution of the patterned portion is increased in response to the electron-absorption substrate suppressing the backscattering of the electrons.


Michael Parker Photo 4

Getter Layer Lead Structure For Eliminating Resistance Increase Phonomena And Embrittlement And Method For Making The Same

US Patent:
5680282, Oct 21, 1997
Filed:
Oct 24, 1996
Appl. No.:
8/738973
Inventors:
Richard H. Alhert - San Jose CA
James K. Howard - Morgan Hill CA
Michael A. Parker - Fremont CA
Assignee:
International Business Machine Corporation - Armonk NY
International Classification:
G11B 539
US Classification:
360113
Abstract:
A thin film lead structure resistant to resistance increase phenomenon resulting from contamination by mobile impurities. A thin film lead is disposed proximate to a getter layer material having a higher affinity for mobile impurities that the thin film lead. The getter layer material captures mobile impurities and prevents their migration into the thin film lead. The getter layer material may be formed over and in contact with the thin film lead, may be encapsulated within the thin film lead, or both. The getter layer material comprises a rare earth metal selected from the group consisting of yttrium, scandium, lanthanum, cerium, praseodymium, neodymium, samarium, gadolinium, terbium, dysprosium, holmium, erbium, and ytterbium. The thin film lead is preferably tantalum, but may be selected from the group consisting of niobium, vanadium, chromium, molybdenum, tungsten and iron. An alternate embodiment of the invention includes a transition metal comprising titanium, zirconium, or hafnium as the getter layer.


Michael Parker Photo 5

Standards For The Calibration Of A Vacuum Thermogravimetric Analyzer For Determination Of Vapor Pressures Of Compounds

US Patent:
7059768, Jun 13, 2006
Filed:
Mar 21, 2005
Appl. No.:
11/086599
Inventors:
Malika Dothresa Carter - San Jose CA, US
Michael Andrew Parker - Fremont CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands - Amsterdam
International Classification:
G01K 7/38
US Classification:
374176, 374 1, 374 14, 2524081, 252 6255, 252962
Abstract:
The invention provides a set of standards for accurately calibrating a vacuum thermogravimetric analyzer (VTGA). The invention solves the problem of calibrating a VTGA by using the actual magnetic transitions and associated transition temperatures, or Curie temperatures, T's, of a set of standards which can be used in-situ at the location of the sample holder obviating the difficulties associated with indirect methods of calibration. The set of standards permits accurate calibration through sufficiently numerous calibration points over a rather limited low-temperature range for determining vapor pressures of compounds. The set of temperature calibration standards is fabricated from slugs of ferromagnetic material. The composition of the ferromagnetic material in each slug is altered by alloying a ferromagnetic constituent with a non-ferromagnetic constituent to provide a plurality of standards with different Curie temperature over the limited temperature range. In particular, an embodiment of the invention using alloys of Ni and Cu where the amount of Cu varies between less than 0% up to approximately 50% by weight provides a set of standards that can span temperatures in any selected range from approximately 300 C to −150 C respectively.


Michael Parker Photo 6

Photolithographic Method And Mask Devices Utilized For Multiple Exposures In The Field Of A Feature

US Patent:
7919231, Apr 5, 2011
Filed:
Sep 4, 2007
Appl. No.:
11/899383
Inventors:
Mary Kathryn Gutberlet - Prunedale CA, US
Rambod Nader - Campbell CA, US
Michael Andrew Parker - Fremont CA, US
Douglas Johnson Werner - Fremont CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G03C 5/00, G03F 1/00, G03F 7/00
US Classification:
430394, 430 5, 430311
Abstract:
A photolithographic method for forming a plurality of characters on a device utilizes a mask set that includes a plurality of photolithographic masks, wherein each mask includes at least one non-opaque mask character field area that surrounds a non-opaque mask character area. Photoresist is exposed to radiation energy density through the set of masks using the masks sequentially to create at least one character field area of the photoresist, and a character area of the photoresist. Ultimately, because the character areas of the photoresist are exposed to some light energy density from the non-opaque mask character field areas during each mask exposure step, the total photoresist exposure time to create the series of characters is less than that of the prior art.


Michael Parker Photo 7

Lead-Defined And Shaped Magnetic Sensor

US Patent:
7075761, Jul 11, 2006
Filed:
Aug 27, 2002
Appl. No.:
10/237654
Inventors:
Michael Andrew Parker - Fremont CA, US
Assignee:
Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam
International Classification:
G11B 5/39
US Classification:
3603273, 36032412
Abstract:
A magnetic recording transducer, useful in a magnetic data storage device, having a read element with improved magnetic stability and a narrow track width is described. An MR stripe according to the invention has a magnetic-stability inducing (MSI) shape selected from an essentially trapezoidal shape, an essentially hexagonal shape, an essentially race-track shape, and an essentially half race track shape. These MSI shapes are oriented in a plane perpendicular to the air-bearing surface (ABS). The MSI shapes are used to encourage the formation of a single magnetic domain state with magnetization direction parallel to the ABS in the absence of a magnetic bias. In one embodiment according to the invention the sensor structure is overlaid on the sides of the top surface with layers of electrically conductive material (overlaid leads) to define an approximately rectangular active region of the larger MSI shape. A sensor structure according to the invention with overlaid leads will have a narrower track width with improved magnetic stability than a sensor which has a comparable volume of magnetoresistive material in a rectangular MR stripe. In another embodiment of the invention the sensor structure has edge-butt leads that make contact at the outer edges of the sensor without substantially overlaying the top surface.


Michael Parker Photo 8

Pole Tip Trimmed Magnetic Recording Head With Minimal Edge Rounding

US Patent:
7259934, Aug 21, 2007
Filed:
Oct 7, 2003
Appl. No.:
10/681684
Inventors:
Thomas Young Chang - San Jose CA, US
Michael Andrew Parker - Fremont CA, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11B 5/127
US Classification:
360126, 360122
Abstract:
In the present method for manufacturing a magnetic write head a focused ion beam (FIB) tool is utilized to mill the side edges of a Ppole, in order to provide a narrowed track width. Prior to milling, a thin film layer of material is deposited upon the Ppole tip. The milling boxes of the FIB tool are properly aligned upon the layer with reference to the location of the P pole tip. Milling of the lateral edges of the Ppole tip is then conducted to the appropriate depth, and the layer of material is removed. The resulting Ppole tip has sharp lateral edges, rather than the rounded edges that are produced in prior art FIB processing methods that do not utilize the thin film layer. In a preferred implementation, the FIB tool is utilized first to deposit the thin film layer and thereafter to perform the milling operation.


Michael Parker Photo 9

Thin Film Magnetic Recording Medium Having High Coercivity

US Patent:
2002009, Jul 25, 2002
Filed:
Jun 4, 1999
Appl. No.:
09/326240
Inventors:
KEVIN ROBERT COFFEY - SAN JOSE CA, US
JAMES KENT HOWARD - MORGAN HILL CA, US
MICHAEL ANDREW PARKER - FREMONT CA, US
International Classification:
G11B005/65
US Classification:
428/69400T
Abstract:
An alloy of tetragonal polycrystalline structure acts as a thin film magnetic medium. The medium can be for recording or sensing magnetic transitions representative of data and is of a thickness less than about 200 , and has a coercivity in excess of about 2000 Oe. The film is in the L1o phase which is suitable for longitudinal recording and can be constituted by an alloy selected from cobalt or iron together with platinum or palladium. The film is formed by sputtering from a target and thereafter annealing the thin film and at a temperature in excess of about 500° C.


Michael Parker Photo 10

Thin Film Magnetic Recording Medium Having High Coercivity

US Patent:
5989728, Nov 23, 1999
Filed:
Jun 12, 1996
Appl. No.:
8/662910
Inventors:
Kevin Robert Coffey - San Jose CA
James Kent Howard - Morgan Hill CA
Michael Andrew Parker - Fremont CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11B 564
US Classification:
428611
Abstract:
An alloy of tetragonal polycrystalline structure acts as a thin film magnetic medium. The medium can be for recording or sensing magnetic transitions representative of data and is of a thickness less than about 200. ANG. , and has a coercivity in excess of about 2000 Oe. The film is in the L1o phase which is suitable for longitudinal recording and can be constituted by an alloy selected from cobalt or iron together with platinum or palladium. The film is formed by sputtering from a target and thereafter annealing the thin film and at a temperature in excess of about 500. degree. C.