MICHAEL JAMES SMITH, MD
Medical Practice at Montgomery Blvd, Albuquerque, NM

2003002, Feb 6, 2003

Jun 6, 2002

10/164286

Michael Smith - Albuquerque NM, US
Joel Stevenson - Albuquerque NM, US
Pamela Ward - Rio Rancho NM, US

C23C014/00

204/298010, 204/298030

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

6261470, Jul 17, 2001

Apr 23, 1998

9/065307

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation - Albuquerque NM

G01J 330, G06F 1900, C23C 1400

216 60

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.

6165312, Dec 26, 2000

Apr 23, 1998

9/064966

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation - Albuquerque NM

C23F 102, C23C 1400, G01L 2130

156345

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.

6223755, May 1, 2001

Apr 23, 1998

9/065195

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation

B08B 704

134 11

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.

6157447, Dec 5, 2000

Apr 23, 1998

9/065359

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation - Albuquerque NM

G01J 330

356316

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.

6246473, Jun 12, 2001

Apr 23, 1998

9/064991

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation - Albuquerque NM

G01J 330, G01L 2130

356316

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.

6132577, Oct 17, 2000

Apr 23, 1998

9/065362

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation - Albuquerque NM

C23C 1434

20429832

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.

6254717, Jul 3, 2001

Apr 23, 1998

9/064965

Michael Lane Smith - Albuquerque NM
Joel O'Don Stevenson - Albuquerque NM
Pamela Peardon Denise Ward - Rio Rancho NM

Sandia Corporation - Albuquerque NM

C23F 102, C23F 108

156345

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect.