Inventors:
Matthew Bray - Portland OR, US
Marc Castagna - Portland OR, US
Assignee:
FEI COMPANY - Hillsboro OR
International Classification:
G01N 23/00
Abstract:
Imprecisely located defects are imaged by milling a series of slices and performing a light, preferential etch to provide a topographical interface between materials having similar secondary electron emission characteristics. The slices are sufficiently small to capture small defects, but are sufficiently large to overcome problems with redeposition.