Inventors:
Vernon Yost - Lakewood CO, US
Hao-Chih Yuan - Golden CO, US
Matthew Page - Golden CO, US
Assignee:
ALLIANCE FOR SUSTANABLE ENERGY, LLC - Golden CO
International Classification:
H01L 21/306
Abstract:
A wet-chemical method of producing a black silicon substrate. The method comprising soaking single crystalline silicon wafers in a predetermined volume of a diluted inorganic compound solution. The substrate is combined with an etchant solution that forms a uniform noble metal nanoparticle induced Black Etch of the silicon wafer, resulting in a nanoparticle that is kinetically stabilized. The method comprising combining with an etchant solution having equal volumes acetonitrile/acetic acid:hydrofluoric acid:hydrogen peroxide.