MARK B SMITH, MD
Radiology at Barbara Jordan Blvd, Austin, TX

2006019, Sep 7, 2006

Feb 27, 2006

11/363755

Aviv Frommer - D.N. Misgav, IL
Vladimir Levinski - Nazareth llit, IL
Mark Smith - Austin TX, US
Jeffrey Byers - Lexington TX, US
Chris Mack - Austin TX, US
Michael Adel - Zichron Ya'akov, IL

G01B 11/00

356401000

In one embodiment, a system for imaging an acquisition target or an overlay or alignment semiconductor target is disclosed. The system includes a beam generator for directing at least one incident beam having a wavelength λ towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, λ, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images. In one application the detector detects a sinusoidal image of an acquisition target with the same pitch as the designed target and the controller analyzes the pitch of the sinusoidal image compared to design data to determine whether the target has been successfully acquired. In a second application a first and second periodic target that each have a specific pitch p are imaged so that the detector detects a first sinusoidal image of the first target and a second sinusoidal image of the second target and the controller analyzes the first and second sinusoidal image to determine whether the first and second targets have an overlay or alignment error.

2011011, May 12, 2011

Oct 29, 2010

12/915455

John J. Biafore - North Scituate RI, US
Mark D. Smith - Austin TX, US
David Blankenship - Austin TX, US

KLA-TENCOR CORPORATION - Milpitas CA

G06F 17/10, G06G 7/58, G06F 7/60

703 2, 703 12

A processor based method for measuring dimensional properties of a photoresist profile by determining a number acid generators and quenchers within a photoresist volume, determining a number of photons absorbed by the photoresist volume, determining a number of the acid generators converted to acid, determining a number of acid and quencher reactions within the photoresist volume, calculating a development of the photoresist volume, producing with the processor a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume, and measuring the dimensional properties of the photoresist profile.

2012014, Jun 7, 2012

Dec 6, 2010

12/961314

Mark Douglas Smith - Austin TX, US

INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY

G06F 15/177

713 1

A method dynamically determines the contents of a Boot Logical Volume from within a System Management Service menu. Responsive to receiving the scan request, a system dynamically scans a root volume group to identify special files associated with the various base operating systems stored on the boot logical volumes of the root volume group. The system then maps the files to a specific operating systems version, and presents a list of the available operating systems on the various boot logical volumes to a user.

2014006, Mar 6, 2014

Aug 28, 2013

14/011989

Mark D. Smith - Austin TX, US
David Blankenship - Austin TX, US

KLA-Tencor Corporation - Milpitas CA

G06F 19/00

703 2, 703 12

A processor based method for measuring dimensional properties of a photoresist profile by determining a number acid generators and quenchers within a photoresist volume, determining a number of photons absorbed by the photoresist volume, determining a number of the acid generators converted to acid, determining a number of acid and quencher reactions within the photoresist volume, calculating a development of the photoresist volume, producing with the processor a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume, and measuring the dimensional properties of the photoresist profile.