LONG NGUYEN, DDS
Dentist at King Rd, San Jose, CA

License number
California 46908
Category
Dentist
Type
General Practice
Address
Address
2593 S King Rd SUITE 2, San Jose, CA 95122
Phone
(408) 270-5384
(408) 270-7799 (Fax)

Organization information

See more information about LONG NGUYEN at bizstanding.com

Long Nguyen DDS

2593 S King Rd, San Jose, CA 95122

Industry:
Dentists, Oral Surgeons
Phone:
(408) 270-5384 (Phone)
Description:
There is 1 doctor at this site. Surgery is not performed at this site.
Long Ngoc Nguyen


Eric Long Nguyen

1562 Cleo Spg Dr, San Jose, CA 95131

Phone:
(408) 474-1637 (Phone)
SIC:
9121 - Legislative Bodies

Professional information

Long Nguyen Photo 1

General Counsel At Petaengine, Inc.

Position:
General Counsel at PetaEngine, Inc., Consultant at Black & Veatch
Location:
San Jose, California
Industry:
Law Practice
Work:
PetaEngine, Inc. - San Jose, California USA since 2012 - General Counsel Black & Veatch - Vietnam since 2005 - Consultant Asia Hydro, Ltd. - Singapore, California (USA) and China (Suzhou & Shanghai) 2007 - 2009 - Executive Chairman/General Counsel DANIDA 2004 - 2005 - Senior International Legal Consultant ULand Airlines - Taipei, Taiwan 1996 - 2001 - General Counsel Graham & James - Newport Beach, California USA 1984 - 1987 - Associate Attorney
Education:
Chicago-Kent College of Law, Illinois Institute of Technology 1981 - 1984
Juris Doctor, Law
California State University - Long Beach 1976 - 1980
BS, Business Administration
Interests:
Fishing, hunting
Honor & Awards:
Who's Who in Practicing Attorneys, Who's Who in California
Languages:
English, French, Vietnamese, Chinese


Long Nguyen Photo 2

Long Nguyen

Specialties:
Purchase Loan, Refinancing, Home Equity
Work:
Lender
1402 Lincoln Ave, San Jose 95125
(408) 998-8371


Long Nguyen Photo 3

Long Nguyen, San Jose CA - Agent

Work:
Century 21
San Jose
(408) 238-5111


Long Nguyen Photo 4

Aqueous Cleaning Composition Containing Copper-Specific Corrosion Inhibitor For Cleaning Inorganic Residues On Semiconductor Substrate

US Patent:
2013007, Mar 21, 2013
Filed:
Oct 23, 2012
Appl. No.:
13/658415
Inventors:
Ma. Fatimo Seijo - Hayward CA, US
David Bernhard - Kooskia ID, US
Long Nguyen - San Jose CA, US
Assignee:
ADVANCED TECHNOLOGY MATERIALS, INC. - Danbury CT
International Classification:
C11D 3/30, C11D 3/32, C11D 3/33
US Classification:
510175
Abstract:
A semiconductor wafer cleaning formulation, including 1-35% wt. fluoride source, 20-60% wt. organic amine(s), 0.1-40% wt. nitrogenous component, e.g., a nitrogen-containing carboxylic acid or an imine, 20-50% wt. water, and 0-21% wt. metal chelating agent(s). The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.


Long Nguyen Photo 5

Aqueous Cleaning Composition Containing Copper-Specific Corrosion Inhibitor For Cleaning Inorganic Residues On Semiconductor Substrate

US Patent:
6896826, May 24, 2005
Filed:
Oct 23, 2001
Appl. No.:
10/047554
Inventors:
William A. Wojtczak - Austin TX, US
Ma. Fatima Seijo - Hayward CA, US
David Bernhard - Newtown CT, US
Long Nguyen - San Jose CA, US
Assignee:
Advanced Technology Materials, Inc. - Danbury CT
International Classification:
C09K013/00, C09K013/04, C09K013/08, C09K013/06, H01L021/302
US Classification:
252 791, 252 792, 252 793, 252 794, 438706, 438745, 134 12, 134 13
Abstract:
A semiconductor wafer cleaning formulation, including 1-35% wt. fluoride source, 20-60% wt. organic amine(s), 0. 1-40% wt. nitrogenous component, e. g. , a nitrogen-containing carboxylic acid or an imine, 20-50% wt. water, and 0-21% wt. metal chelating agent(s). The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.


Long Nguyen Photo 6

Latch Mechanism For Communications Module

US Patent:
2014007, Mar 20, 2014
Filed:
Nov 8, 2012
Appl. No.:
13/672396
Inventors:
Long Nguyen - San Jose CA, US
Assignee:
FINISAR CORPORATION - Sunnyvale CA
International Classification:
H05K 7/16
US Classification:
361726
Abstract:
In an example embodiment, a module latch mechanism includes a follower and a driver. The follower is configured to be slidingly positioned relative to a housing and to facilitate selective engagement of the housing with a host device. The follower includes a retaining member configured to retain a resilient member in at least one direction such that the resilient member urges the follower towards a first position relative to the housing. The driver is configured to be rotatingly positioned relative to the housing. The driver includes a cam configured to urge the follower towards a second position relative to the housing as the driver is rotated from a latched position to an unlatched position.


Long Nguyen Photo 7

Element Of An Audio Video And Computer Data Cartridge

US Patent:
D411533, Jun 29, 1999
Filed:
May 12, 1998
Appl. No.:
D/087953
Inventors:
Syed H. Iftikar - Pleasanton CA
Albert J. Guerini - Gilroy CA
Long Nguyen - San Jose CA
Assignee:
Castlewood Systems, Inc. - Milpitas CA
International Classification:
1499
US Classification:
D14121


Long Nguyen Photo 8

Electronic Shelf Label Attachment Mechanism With Height Adjustment

US Patent:
2009017, Jul 16, 2009
Filed:
Jan 11, 2008
Appl. No.:
12/008514
Inventors:
Long Van Nguyen - San Jose CA, US
International Classification:
G09F 9/00
US Classification:
40446
Abstract:
An electronic shelf label (ESL) system for attachment to a shelf and a universal attachment mechanism is disclosed. In accordance with the purpose of this invention, as embodied and broadly described herein, the invention is an ESL system for attachment to a C-channel type shelf that comprises a large ESL having a body housing a display on the front side and a plurality of catches formed at different heights on the rear side, wherein the body of the large ESL is releasably coupled to an adapter mounted to the C-channel type shelf using a catch of the plurality of catches, thus can be mounted at different heights.


Long Nguyen Photo 9

Anti-Rattle Mechanism For A Removable Video Disk Cartridge

US Patent:
6011773, Jan 4, 2000
Filed:
Nov 10, 1998
Appl. No.:
9/189732
Inventors:
Albert Guerini - Gilroy CA
Syed H. Iftikar - Pleasanton CA
Frank Morris - San Jose CA
Long Nguyen - San Jose CA
Assignee:
Castlewood Systems, Inc. - Pleasanton CA
International Classification:
G11B 370, G11B 584
US Classification:
369291
Abstract:
Devices, systems, and methods prevent rigid recording media for video and other data from rattling within a cartridge when that cartridge is removed from a disk drive. To decrease rattling (and the resulting damage to the disk), a hub of the disk is urged against an inner surface of the cartridge housing. A door translates laterally to provide access to the disk within the cartridge. A feature is defined by an inner surface of the cartridge housing, and one or more resilient arms extend from the door assembly so as to engage the feature when the door moves towards a closed position. The feature deflects the arm axially against the disk, so that the arm can act as both an actuation mechanism and a biasing spring.


Long Nguyen Photo 10

Polishing Slurries For Copper And Associated Materials

US Patent:
6936542, Aug 30, 2005
Filed:
Dec 18, 2001
Appl. No.:
10/022317
Inventors:
William A. Wojtczak - Santa Clara CA, US
Thomas H. Baum - New Fairfield CT, US
Long Nguyen - San Jose CA, US
Cary Regulski - San Jose CA, US
Assignee:
Advanced Technology Materials, Inc. - Danbury CT
International Classification:
H01L021/302
US Classification:
438692, 438693
Abstract:
A chemical mechanical polishing slurry and method for using the slurry for polishing copper, barrier material and dielectric material that comprises a first and second slurry. The first slurry has a high removal rate on copper and a low removal rate on barrier material. The second slurry has a high removal rate on barrier material and a low removal rate on copper and dielectric material. The first and second slurries at least comprise silica particles, an oxidizing agent, a corrosion inhibitor, and a cleaning agent.