LINH D NGUYEN
Vehicle Board in Allentown, PA
License number
Pennsylvania MV184764
Category
Vehicle Board
Type
Vehicle Salesperson
Address
Address
Allentown, PA 18103
Professional information
Manufacturing Process Engineer At Jdsu
Position:
Manufacturing Process Engineer at JDSU
Location:
Allentown, Pennsylvania Area
Industry:
Semiconductors
Work:
JDSU
since May 2013
-
Manufacturing Process Engineer
II-VI Incorporated
- Pine Brook, NJ Feb 2010 - 2013
-
Manufacturing Process Engineer
API Technologies Corp.
- Somerset, NJ Jun 2007 - Feb 2010
-
Process Engineer
NanoOpto Corporation
- Somerset, NJ Mar 2003 - Jun 2007
-
Process Engineer
Agere System Inc
- Breinigsville, PA Jan 2000 - Mar 2003
-
Process Engineer
Lucent Technologies Inc
- Breinigsville, Pennsylvania Oct 1997 - Jan 2000
-
Process Analyst
Education:
Lincoln Technical Institute-Allentown 1996 - 1997
University of Ho Chi Minh city 1989 - 1992
University of Ho Chi Minh city 1989 - 1992
Languages:
Vietnamese, English
Exposure Methods For Forming Patterned Layers And Apparatus For Performing The Same
US Patent:
2010029, Nov 18, 2010
Filed:
May 15, 2009
Appl. No.:
12/466853
Inventors:
Martin Moskovits - Santa Barbara CA, US
Linh Nguyen - Allentown PA, US
Robert Koefer - Whitehall PA, US
Qihong Wu - Somerset NJ, US
Xu Zhang - Montville NJ, US
Linh Nguyen - Allentown PA, US
Robert Koefer - Whitehall PA, US
Qihong Wu - Somerset NJ, US
Xu Zhang - Montville NJ, US
Assignee:
API Nanofabrication and Research Corp. - Somerset NJ
International Classification:
G03F 7/20
US Classification:
430323, 430322, 430325, 430326
Abstract:
Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength λ and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at λ through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.
Patterned Polarization-Sensitive Optical Elements And Devices Using The Same
US Patent:
8120861, Feb 21, 2012
Filed:
Sep 21, 2009
Appl. No.:
12/563597
Inventors:
Martin Moskovits - Santa Barbara CA, US
Qihong Wu - Somerset NJ, US
Robert Koefer - Whitehall PA, US
Xu Zhang - Montville NJ, US
Linh Nguyen - Allentown PA, US
Thomas Tombler - Somerset NJ, US
Qihong Wu - Somerset NJ, US
Robert Koefer - Whitehall PA, US
Xu Zhang - Montville NJ, US
Linh Nguyen - Allentown PA, US
Thomas Tombler - Somerset NJ, US
International Classification:
G02B 7/02
US Classification:
359819
Abstract:
In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object.