LAURENT SIMON VESIER
Pilots at Decidedly Ln, Bear, DE
License number
Delaware A4191809
Issued Date
Dec 2015
Expiration Date
Dec 2017
Category
Airmen
Type
Authorized Aircraft Instructor
Address
Address
46 Decidedly Ln, Bear, DE 19701
Professional information
Resilient Polishing Pad For Chemical Mechanical Polishing
US Patent:
2005007, Mar 31, 2005
Filed:
Sep 26, 2003
Appl. No.:
10/673002
Inventors:
John Roberts - Newark DE, US
Laurent Vesier - Bear DE, US
Laurent Vesier - Bear DE, US
International Classification:
B24B019/00
US Classification:
451433000
Abstract:
A resilient, laminated polishing pad for chemical mechanical polishing is disclosed. The polishing pad includes a base layer and a polishing layer bonded by a hot-melt adhesive. The hot-melt adhesive of the present invention provides a Tpeel strength for the polishing pad of at least greater than 40 Newtons at 305 mm/min, reducing pad delamination.